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Influence of aberration on performance during use of resolution enhancement technology

机译：使用分辨率增强技术时像差对性能的影响

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Abstract: We have investigated the influence of a spherical aberration on the printing characteristics with modified illumination. At first, we have developed a simple method for measuring the aberration function with an alternating phase shift mask (PSM), and have measured that in the projection optics of a commercially available KrF stepper. Then the anomalous phenomena observed in the printing with modified illumination are examined with the simulated aerial images with the measured spherical aberration. As a result, we found good coincidence between the simulated images and the anomalies. In conclusion, the origin of the anomalies is ascribed to the spherical aberration in the projection optics. !3
机译：摘要：我们研究了球面像差对改进照明条件下印刷特性的影响。首先，我们开发了一种使用交替相移掩模（PSM）来测量像差函数的简单方法，并且已经在商用KrF步进器的投影光学系统中进行了测量。然后，通过模拟的航拍图像和测得的球差，检查在修改照明条件下打印时观察到的异常现象。结果，我们在模拟图像和异常之间找到了很好的一致性。总之，异常的起因是投影光学系统中的球差。 ！3

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