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New variable-transmission illumination technique optimized with design rule criteria

机译:根据设计规则标准优化的新型可变透射照明技术

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Abstract: We report on a novel technique for tuning the illumination of a lithography tool through the use of variable transmission apertures. In conjunction with this illumination technique, we have developed simulation software capable of identifying the optimum source plane coherence and intensity distribution to increase process latitude. This 'system' approach is capable of analyzing features specific to a given device level, or selected subsets of structure types within a given level. The fabrication of the aperture involves selectively depositing $alpha@-C onto a quartz plate that is inserted into the illuminator. Experimental testing has shown this film to be stable in its optical properties with extended exposure to DUV light. A description of the simulation software, aperture fabrication techniques, materials used, and experimental results for several aperture configurations are reported. !7
机译:摘要:我们报告了一种通过使用可变透射孔径来调节光刻工具的照明的新颖技术。结合这种照明技术,我们开发了能够识别最佳源平面相干性和强度分布以增加处理范围的仿真软件。这种“系统”方法能够分析特定于给定设备级别或给定级别内结构类型的选定子集的功能。孔的制造涉及选择性地将α-C沉积到插入照明器的石英板上。实验测试表明,该膜在长时间暴露于DUV光下具有稳定的光学性能。报告了对几种孔径配置的仿真软件,孔径制造技术,所用材料以及实验结果的描述。 !7

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