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New variable-transmission illumination technique optimized with design rule criteria

机译:具有设计规则标准优化的新可变传输照明技术

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We report on a novel technique for tuning the illumination of a lithography tool through the use of variable transmission apertures. In conjunction with this illumination technique, we have developed simulation software capable of identifying the optimum source plane coherence and intensity distribution to increase process latitude. This 'system' approach is capable of analyzing features specific to a given device level, or selected subsets of structure types within a given level. The fabrication of the aperture involves selectively depositing $alpha@-C onto a quartz plate that is inserted into the illuminator. Experimental testing has shown this film to be stable in its optical properties with extended exposure to DUV light. A description of the simulation software, aperture fabrication techniques, materials used, and experimental results for several aperture configurations are reported.
机译:我们通过使用可变变速器孔来报告一种用于调整光刻工具照明的新技术。 结合这种照明技术,我们开发了能够识别最佳源平面相干性和强度分布的仿真软件,以增加过程纬度。 该“系统”方法能够分析特定于给定设备级别的特征,或者在给定级别内的结构类型的所选子集。 孔的制造涉及选择性地将$ alpha @ -c沉积到插入照明器中的石英板上。 实验测试已经显示出该薄膜在其光学性质中稳定,延长了DuV光。 报道了仿真软件,孔径制造技术,所用材料的描述和几个孔径配置的实验结果。

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