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Lithography simulation employing rigorous solutions to Maxwell's equations

机译:使用严格求解麦克斯韦方程组的光刻模拟

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Abstract: A method of obtaining rigorous solutions to Maxwell's equations for the transmission of light through a photomask, both chrome-based and phase-shifting, is presented. The electromagnetic simulator will predict the transmission of light through the mask taking into account material properties, width, and thickness of the structures on the mask. This electromagnetic simulation will then be incorporated into the software package PROLITH/2 for complete simulation down to the resist level. Examples of lithography simulation using these rigorous solutions will be presented. !26
机译:摘要:提出了一种获得麦克斯韦方程组严格解的方法,该方法用于基于铬的和相移的光通过光掩模的传输。电磁模拟器将考虑到掩模上结构的材料属性,宽度和厚度,来预测光通过掩模的透射率。然后,此电磁仿真将合并到软件包PROLITH / 2中,以进行完整的仿真,直至抗蚀剂级别。将介绍使用这些严格解决方案的光刻仿真示例。 !26

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