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LAVA: lithography analysis using virtual access

机译:LAVA:使用虚拟访问的光刻分析

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Abstract: A web site allowing remote operation of the SPLAT, SAMPLE, TEMPEST and SIMPL simulators has been developed to promote collaborative work on lithography and in particular on EUV technology. Based on the extensive use of platform independent programming languages, LAVA is accessible from all modern computing platforms. The software supporting the web site is available to others in creating similar web site sites and in making simulators such as those from other universities 'play' together. The web site explores new paradigms in remote operation of lithography simulators and introduces more application-oriented modes of interaction with technologists. The LAVA web site URL is http://cuervo.eecs.berkeley.edu/Volcano/ !4
机译:摘要:已经开发了一个允许对SPLAT,SAMPLE,TEMPEST和SIMPL仿真器进行远程操作的网站,以促进光刻技术(尤其是EUV技术)的协同工作。基于广泛使用平台无关的编程语言,可以从所有现代计算平台访问LAVA。其他人可以使用支持该网站的软件来创建类似的网站,并使其他大学的模拟器“一起玩”。该网站探索了光刻模拟器远程操作的新范例,并介绍了与技术人员互动的更多面向应用的模式。 LAVA网站URL是http://cuervo.eecs.berkeley.edu/Volcano/!4

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