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Overlay accuracy of reticles

机译:标线的叠加精度

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Abstract: This paper describes the study on overlay accuracy of reticles, using a reticle set for DRAM. It is found that single reticle pattern placement has to be higher accuracy than overlay of reticles, which may be a majority in the total overlay accuracy. Concerning some points of a reticle set, we found that there is a very large value. To match overlay accuracy of reticles with the demand of devices, we have shown that the suitable reticle exposure system has to be used and managed exactly. In order to assure overlay accuracy of a reticle set, it was proposed that single reticle pattern placement accuracy must be higher than overlay accuracy demand and the overlay accuracy yield also should be shown in some cases. !4
机译:摘要:本文介绍了一种用于标线片组的DRAM标线覆盖精度的研究。已经发现,单掩模版图案放置必须比掩模版的覆盖物具有更高的精度,掩模版的覆盖物可能是总覆盖物准确性的大部分。关于标线集的某些点,我们发现它的值非常大。为了使掩模版的覆盖精度与设备的需求相匹配,我们已经表明必须使用和管理合适的掩模版曝光系统。为了确保掩模版组的重叠精度,提出了单个掩模版图案放置精度必须高于重叠精度要求,并且在某些情况下还应当显示重叠精度的合格率。 !4

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