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Optical lens specifications from the user's perspective

机译：用户角度的光学镜片规格

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Abstract: We develop three main topics in support of further understanding and specifying wavefront aberrations from the lithographer's point of view. The concept of the Magnitude Weighted Aberration is introduced providing a convenient and rapid numerical method for assessing the interaction of wavefront aberrations with reticle pattern and illumination mode. This analysis suggests that the advanced lithographic lens user will require unprecedented correction on the total wavefront aberration to realize the full potential of the imaging system in high yielding integrated circuit fabrication. Specific details on the required aberration control are provided with a Monte Carlo tolerancing analysis of the RMS wavefront error using lithographic CD control and pattern placement as quality metrics. Patten placement proves to be as sensitive to wavefront aberrations as CD control forcing a tight specification on the asymmetric aberration components even when a large focus and exposure latitude is available. Based on the wavefront specifications generated it is imperative that the lithographic lens user be able to independently de-couple and quantify the state of certain aberration coefficients. Toward this goal, we demonstrate an aberration reverse engineering procedure using experimental pattern placement error as the input response. !15
机译：摘要：我们开发了三个主要主题，以帮助进一步理解和从光刻师的角度指定波前像差。引入了幅度加权像差的概念，为评估波前像差与标线片图案和照明模式之间的相互作用提供了一种方便快捷的数值方法。该分析表明，高级光刻透镜用户将需要对总波前像差进行前所未有的校正，以实现成像系统在高产量集成电路制造中的全部潜力。使用平版印刷CD控制和图案放置作为质量指标，通过RMS波前误差的蒙特卡罗公差分析提供了所需像差控制的特定细节。与CD控制一样，即使在可以获得较大的聚焦和曝光范围的情况下，对CD控件也必须严格规范非对称像差分量，Patten放置对波前像差同样敏感。基于所产生的波阵面规格，光刻透镜用户必须能够独立解耦并量化某些像差系数的状态。为了实现这一目标，我们演示了一种使用实验图案放置误差作为输入响应的像差逆向工程程序。 ！15

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