Abstract: In this paper, we will show that it is possible to generate very small lenses by melting islands of inorganic photoresist on a glass substrate. The inorganic photoresist composited by us is suitable to be exposed by Electron Beam (EBE) or X-Ray. We have obtained the lithophotography pattern with 0.6 micrometer line width by EBE exposure. Because the resist pattern will not swell and distort in the developing solution, so there is no problem of shelf-life. We have made lenses with diameter ranging from 0.8 mm to 1.0 mm in the form of spheres and also have studied their optical properties. !2
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