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Reformulation for latent image formation model in photolithography using numerical absorbing boundary condition

机译:利用数值吸收边界条件重构光刻中潜像形成模型

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Abstract: A method for simulating latent image formation in a photoresist illuminated by an arbitrary imaging system is presented. The perfectly matched layer absorbing boundary condition is applied to take wave propagation in the infinite region surrounding the photoresist into account. The validity of the method is examined by comparing the results with those made by the vertical propagation model and the previous two- dimensional models. !24
机译:摘要:提出了一种模拟由任意成像系统照射的光刻胶中潜像形成的方法。应用完全匹配的层吸收边界条件以考虑在光致抗蚀剂周围的无限区域中的波传播。通过将结果与垂直传播模型和先前的二维模型的结果进行比较,检验了该方法的有效性。 !24

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