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首页> 外文会议>Optical Microlithography XIX pt.1 >Effects of laser bandwidth on OPE in a modern lithography tool
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Effects of laser bandwidth on OPE in a modern lithography tool

机译：现代光刻工具中激光带宽对OPE的影响

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The OPE signature of a lithographic stepper or scanner has become a very important characteristic of the tool, as it determines the OPC correction to be applied to reticles exposed on that tool. The signature depends on a variety of detailed information about the scanner lens and illuminator, which in turn depend on the characteristics of the illumination light from the laser. Specifically, changes in the laser bandwidth should impact OPE as the lens exhibits some chromatic aberration. Tool-to-tool differences and time fluctuation of the laser bandwidth could cause variations in OPE tool matching and stability. To assess this, a detailed study of laser bandwidth effects on OPE was performed. A sensitive spectrometer was connected to a litho laser, allowing careful measurements of both the FWHM and E_(95) parameters of the laser spectral profile. Lithographic modeling using the chromatic response of the lens was run in order to predict effects. Exposures of CD through pitch were made to test the modeling. Finally, the bandwidth data was correlated with litho sensitivity to create a "bandwidth effect", put in context with the other common scanner parameters affecting OPE.
机译：光刻步进机或扫描仪的OPE签名已成为该工具的一个非常重要的特征，因为它确定了要应用于该工具上曝光的标线的OPC校正。签名取决于有关扫描仪镜头和照明器的各种详细信息，这些信息又取决于来自激光器的照明光的特性。特别是，由于透镜表现出一些色差，因此激光带宽的变化会影响OPE。工具之间的差异和激光带宽的时间波动可能会导致OPE工具匹配和稳定性方面的变化。为了评估这一点，对激光带宽对OPE的影响进行了详细研究。灵敏的光谱仪连接到光刻激光器上，可以仔细测量激光光谱轮廓的FWHM和E_（95）参数。使用镜片的色度响应进行光刻建模，以预测效果。通过间距曝光CD，以测试模型。最后，将带宽数据与光刻灵敏度相关联，以创建“带宽效应”，并与影响OPE的其他常见扫描仪参数结合使用。

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