Evanescent wave imaging in optical lithography

机译：光刻中的van逝波成像

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摘要

New applications of evanescent imaging for microlithography are introduced. The use of evanescent wave lithography (EWL) has been employed for 26nm resolution at 1.85NA using a 193nm ArF excimer laser wavelength to record images in a photoresist with a refractive index of 1.71, Additionally, a photomask enhancement effect is described using evanescent wave assist features (EWAF) to take advantage of the coupling of the evanescent energy bound at the substrate-absorber surface, enhancing the transmission of a mask opening through coupled interference.

机译：介绍了e逝成像在微光刻中的新应用。使用van逝波光刻（EWL）在193nm ArF准分子激光波长下以1.85NA在26nm分辨率下记录折射率为1.71的光致抗蚀剂中的图像。此外，使用is逝波辅助技术描述了光掩模增强效果的特征（EWAF）利用了结合在基质吸收剂表面的bound逝能量的耦合，从而通过耦合干扰增强了掩模开口的透射率。

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来源
《Optical Microlithography XIX pt.1》|2006年|P.61540A.1-61540A.9|共9页
会议地点 San JoseCA(US)
作者
Bruce W. Smith; Yongfa Fan; Jianming Zhou; Neal Lafferty; rew Estroff;
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作者单位

Rochester Institute of Technology, 82 Lomb Memorial Drive, Rochester, New York, 14623;

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会议组织
原文格式 PDF
正文语种 eng
中图分类光刻、掩膜;石版印刷;
关键词
evanescent wave lithography; solid immersion lithography; 193nm immersion lithography;

机译：逝波光刻；固体浸没光刻； 193nm浸没光刻;

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专利

1. Optical waveguides formed by silver ion exchange in Schott SG11 glass for waveguide evanescent field fluorescence microscopy: evanescent images of HEK293 cells [J] . Abdollah Hassanzadeh, Michael Nitsche, Souzan Armstrong, Journal of biomedical optics . 2010,第3期

机译：在Schott SG11玻璃中通过银离子交换形成的光波导，用于波导e逝场荧光显微镜：HEK293细胞的e逝图像
2. Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging [J] . P. Xie, B. W. Smith Journal of Vacuum Science & Technology . 2010,第6期

机译：通过深紫外渐逝光学成像在lambda / 7以下进行投影光刻
3. Superresolution of three-dimensional optical imaging by use of evanescent waves [J] . Chaumet PC, Belkebir K, Sentenac A Optics Letters . 2004,第23期

机译：van逝波对三维光学成像的超分辨率
4. Evanescent wave imaging in optical lithography [C] . Bruce W. Smith, Bruce W. Smith, Jianming Zhou, Conference on Optical Microlithography . 2006

机译：光学光刻中的渐逝波成像
5. Evanescent wave assist features for optical projection lithography . [D] . Lafferty, Neal Vincent. 2011

机译：optical逝波辅助特性用于光学投影光刻。
6. A Double-Taper Optical Fiber-Based Radiation Wave Other than Evanescent Wave in All-Fiber Immunofluorescence Biosensor for Quantitative Detection of Escherichia coli O157:H7 [O] . Zhonghuan Zhang, Fei Hua, Ting Liu, -1

机译：用于定量检测大肠杆菌O157：H7的全光纤免疫荧光生物传感器中基于消逝波的双锥度光纤辐射波
7. Evanescent Wave Imaging in Optical Lithography [O] . Bruce W. Smith, Yongfa Fan, Jianming Zhou, 2012

机译：光学光刻中的van逝波成像
8. Evanescent Field Imaging of Novel Optical Waveguide Structures: An Ultra-HighSpatial Resolution Probe of Topographic, Dielectric, and Spectroscopic Properties [R] . Jackson, H. E., Boyd, J. T. 1996

机译：新型光波导结构的渐逝场成像：地形，介电和光谱特性的超高空间分辨率探头

Evanescent wave imaging in optical lithography

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