• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Photomask and Next-Generation Lithography Mask Technology XIII pt.2 >Shot Number Estimation for EB Direct Writing for Logic LSI Utilizing Character-Build Standard-Cell Layout Technique
【24h】

Shot Number Estimation for EB Direct Writing for Logic LSI Utilizing Character-Build Standard-Cell Layout Technique

机译：利用字符构建标准单元布局技术的逻辑LSI EB直接写入的镜头数量估计

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Electron Beam direct writing (EBDW) technology is the most cost-effective lithography tool for small-volume logic-LSI fabrication. The EB exposure time will be greatly reduced by applying character-projection (CP) aperture. But the applicable number of CP aperture is limited to 25-400 depending upon EB lithography apparatus. The cell-based logic LSIs are composed of standard-cells (SCs) whose number is 400-1000. Therefore, it is impossible to implement all SCs as CP apertures, because the SCs are placed to 4-directions in general. We had proposed the new technique named "Character-Build (CB) standard-cell", and demonstrate the most of the combination-logic SCs can be composed by only 17 CP apertures. In this paper, not only combination-logic SCs but also sequential-logic SCs are considered. The number of EB-shots and the chip-area are estimated for some sample circuits. Compared to the simply-limited SCs, The EB shot number is 30-40% reduced by using proposed CB standard-cell, when the CP aperture numbers are 20-30. Moreover, CB standard-cell was advantageous in the module area. Considering 2-directional placement of SCs, the combination of the EB apparatus with 50-100 CP apertures and the CB standard-cell technique may be the best method for high-speed EB direct-writing.
机译：电子束直接写入（EBDW）技术是用于小批量逻辑LSI制造的最具成本效益的光刻工具。通过使用字符投影（CP）光圈，EB曝光时间将大大减少。但是，取决于EB光刻设备，CP孔径的适用数量限制为25-400。基于单元的逻辑LSI由数量为400-1000的标准单元（SC）组成。因此，不可能将所有的SC都实现为CP孔，因为SC通常是沿4方向放置的。我们提出了一种名为“字符构建（CB）标准单元”的新技术，并演示了大多数组合逻辑SC只能由17个CP孔径组成。在本文中，不仅考虑了组合逻辑SC，而且考虑了顺序逻辑SC。对于某些示例电路，估计了EB射出的数量和芯片区域。与简单限制的SC相比，当CP光圈数为20-30时，使用建议的CB标准单元可以将EB拍摄数量减少30-40％。而且，CB标准单元在模块区域是有利的。考虑到SC的2方向放置，具有50-100 CP孔径的EB设备和CB标准单元技术的结合可能是高速EB直接写入的最佳方法。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号