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Reduction of MDP time through the improvement of verification method

机译：通过改进验证方法减少MDP时间

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摘要

The low-k1 lithography produces large volumes of mask data resulting in more complex optical proximity effect. It puts heavy burden on MDP flow and affects turn around time (TAT). To solve this problem, DP (Distributed Processing) method has been introduced. Even though DP is a very powerful tool to reduce the MDP time, there still might be unexpected pattern drop issue. In order to deal with this issue, the verification step was added in MDP flow. The present verification method is a boolean operation using 2 machine data after converting as a same way. However this verification method has two shortcomings. First, this method is not suitable to detect the same error caused by same software bug. Secondly, it needs double conversion time. A new verification method should be much faster and more accurate than the current verification method. In this paper, the new verification method will be discussed and experimental results using the new verification method will be shown with comparing to the old verification method.
机译：低k1光刻技术会产生大量的掩模数据，从而导致更复杂的光学邻近效应。它给MDP流程带来沉重负担，并影响周转时间（TAT）。为了解决该问题，已经引入了DP（分布式处理）方法。尽管DP是减少MDP时间的非常强大的工具，但仍然可能会出现意外的模式丢失问题。为了解决此问题，在MDP流程中添加了验证步骤。本验证方法是在以相同方式转换之后使用2个机器数据的布尔运算。但是，这种验证方法有两个缺点。首先，此方法不适用于检测由相同软件错误引起的相同错误。其次，它需要两倍的转换时间。一种新的验证方法应该比当前的验证方法更快，更准确。在本文中，将讨论新的验证方法，并与旧的验证方法进行比较，显示使用该新验证方法的实验结果。

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