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Study of thin TiC_xN_(1-x) films fabricated by hybrid magnetron-laser deposition

机译：混合磁控激光沉积制备TiC_xN_（1-x）薄膜的研究

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Titanium- carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited on the same Si substrate, dimensions of 3 cm x 3 cm. Films were fabricated in argon- nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of 15 Jcm~(-2) and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES).

机译：碳氮化钛薄膜在室温下使用结合了直流磁控溅射和KrF脉冲激光沉积（MSPLD）的混合沉积装置生长。将碳和钛同时沉积在尺寸为3 cm x 3 cm的同一Si基板上。在1 Pa-5 Pa的氩氮气氛下，激光通量为15 Jcm〜（-2），磁控管功率为150 W，制备了薄膜。通过保持在靶材和基板之间的RF放电，改变了薄膜的性能。用XRD研究了薄膜的结晶度，并用辉光放电光谱法研究了TiCN层的组成深度分布。

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来源
《Photonics, Devices, and Systems III》|2005年|P.61800G.1-61800G.5|共5页
会议地点 Prague(CZ)
作者
Tomas Kocourek; Miroslav Jelinek; Vaclav Studnicka; Jaromir Kadlec;
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作者单位

Institute of Physics AS CR, Na Slovance 2, 182 21 Prague 8, Czech Republic;

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会议组织
原文格式 PDF
正文语种 eng
中图分类工程光学;
关键词
laser deposition; magnetron; radiofrequency discharge; TiCN; thin films;

机译：激光沉积磁控管射频放电TiCN薄膜;

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专利

1. Thin TiCN Films Prepared by Hybrid Magnetron-Laser Deposition [J] . Tomas Kocourek, Miroslav Jelinek, Jaromir Kadlec, Plasma processes and polymers . 2007,第Supplementa1期

机译：混合磁控激光沉积制备的TiCN薄膜
2. Controlling the Bi content, phase formation, and epitaxial nature of BiMnO_3 thin films fabricated using conventional pulsed laser deposition, hybrid pulsed laser deposition, and solid state epitaxy [J] . S. Havelia, S. Wang, M. Skowronski, Journal of Applied Physics . 2009,第12期

机译：控制使用常规脉冲激光沉积，混合脉冲激光沉积和固态外延制备的BiMnO_3薄膜的Bi含量，相形成和外延特性
3. Ferroelectricity of Hf_xZr_(1-x)O_2 thin films fabricated by 300 ℃ low temperature process with plasma-enhanced atomic layer deposition [J] . Onaya Takashi, Nabatame Toshihide, Sawamoto Naomi, Microelectronic Engineering . 2019,第Jula期

机译：等离子体增强原子层沉积在300℃低温下制备的Hf_xZr_（1-x）O_2薄膜的铁电性
4. Study of thin TiC_xN_(1-x) films fabricated by hybrid magnetron-laser deposition [C] . Tomas Kocourek, Miroslav Jelinek, Vaclav Studnicka, Conference on Photonics, Devices, and Systems . 2006

机译：杂交磁控激光沉积制造的薄TiC_XN_（1-X）膜的研究
5. Microstructure and properties of zirconium-rich lead(zirconium(x)titanium(1-x))oxygen(3) thin films prepared by metallo-organic deposition (MOD) technique. [D] . Huang, Jie. 1997

机译：金属有机沉积（MOD）技术制备的富锆的铅（x（x）钛（1-x））氧（3）薄膜的微观结构和性能。
6. Ultra Uniform Pb0.865La0.09(Zr0.65Ti0.35)O3 Thin Films with Tunable Optical Properties Fabricated via Pulsed Laser Deposition [O] . Shenglin Jiang, Chi Huang, Honggang Gu, 2018

机译：通过脉冲激光沉积制备具有可调光学性能的超均匀Pb0.865La0.09（Zr0.65Ti0.35）O3薄膜
7. MgB2 ultrathin films fabricated by hybrid physical chemical vapor deposition and ion milling [O] . Narendra Acharya, Matthäus A. Wolak, Teng Tan, 2016

机译：通过混合物理化学气相沉积和离子铣削制备mgB2超薄膜
8. Pulsed laser deposition of epitaxial Sr(Ru(sub x)Sn(sub 1-x))O(sub 3) thin film electrodes and KNbO(sub 3)/Sr(Ru(sub x)Sn(sub 1-x))O(sub 3) bilayers [R] . Christen, H. M. , Boatner, L. A. , English, L. Q. , 1995

机译：脉冲激光沉积外延sr（Ru（sub x）sn（sub 1-x））O（sub 3）薄膜电极和KNbO（sub 3）/ sr（Ru（sub x）sn（sub 1-x）） O（sub 3）双层

Study of thin TiC_xN_(1-x) films fabricated by hybrid magnetron-laser deposition

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