Nano-Branched Au Prepared by Electrochemical Deposition using Mesoporous Silicon

机译：介孔硅电化学沉积制备纳米支链金

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As an SERS-active template, Au deposited mesoporous silicon and nano-branched Au rod arrays were prepared by anodization of Si in hydrofluoric acid solutions, followed by the displacement deposition of Au in a solution containing AuCl_4 or by the electrodeposition in a solution containing Au(S_2O_3)(SO_3)_2~(5-). The SERS-activity measured with 4-4' bipyridine as the target molecule was strongly affected by the morphology of Au structures.

机译：作为SERS活性模板，通过在氢氟酸溶液中阳极氧化Si，然后在含AuCl_4的溶液中置换Au或在含Au的溶液中进行电沉积，制备了Au沉积的中孔硅和纳米支化的Au棒阵列。（S_2O_3）（SO_3）_2〜（5-）。以4-4'联吡啶为靶分子测量的SERS活性受Au结构形态的强烈影响。

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来源
《Pits and pores 4: New materials and applications - in memory of ulrich gosele》|2010年|p.109-116|共8页
会议地点 Las Vegas NV(US);Las Vegas NV(US)
作者
Ryohei Miyagawa; Kazuhiro Fukami; Mohamed L. Chourou; Tetsuo Sakka; Yukio H. Ogata;
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作者单位

Institute of Advanced Energy, Kyoto University, Uji, Kyoto 611-0011, Japan;

Institute of Advanced Energy, Kyoto University, Uji, Kyoto 611-0011, Japan;

Institute of Advanced Energy, Kyoto University, Uji, Kyoto 611-0011, Japan;

Institute of Advanced Energy, Kyoto University, Uji, Kyoto 611-0011, Japan;

Institute of Advanced Energy, Kyoto University, Uji, Kyoto 611-0011, Japan;

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正文语种 eng
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2. Electrochemical deposition of mesoporous Pt-Au alloy films in aqueous surfactant solutions: Towards a highly sensitive amperometric glucose sensor [J] . Li C., Wang H., Yamauchi Y. Chemistry: A European journal . 2013,第7期

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3. Structural, Optical, and Thermal Analysis of n-Type Mesoporous Silicon Prepared by Electrochemical Etching [J] . Melhem Amer, Meneses Domingos De Sousa, Andreazza-Vignolles Caroline, The journal of physical chemistry, C. Nanomaterials and interfaces . 2015,第37期

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4. Nano-Branched Au Prepared by Electrochemical Deposition using Mesoporous Silicon [C] . Ryohei Miyagawa, Kazuhiro Fukami, Mohamed L. Chourou, ECS Meeting . 2011

机译：使用中孔硅通过电化学沉积制备的纳米支链Au
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Nano-Branched Au Prepared by Electrochemical Deposition using Mesoporous Silicon

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