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首页> 外文会议>Plasma for bio-decontamination, medicine and food security >Features of the Sterilization by VUV/UV Irradiation of Low-Pressure Discharge Plasma
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Features of the Sterilization by VUV/UV Irradiation of Low-Pressure Discharge Plasma

机译：低压放电等离子体的VUV / UV辐照杀菌特性

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The review is devoted to peculiarities of sterilization of items by VUV/UV radiation of the discharge plasma both in case of the items immersed into the discharge plasma ("direct plasma" treatment), and in case of flowing afterglow plasma ("remote plasma" treatment). The issues of influence of such factors as UV irradiation spectrum, substrate temperature on the UV sterilization efficiency are also considered. For the first time, plasma use for inactivation of microorganisms was proposed by Menashi in 1968 in patent [1]. Sterilization of internal surfaces of glass or plastic containers was performed by means of pulsed corona discharge in argon at atmospheric pressure. It has been shown that the sterilization of spores with surface density up to »6 x 105 spores/cm2 is achieved in a time of less than 0.1 s. Subsequently, this author together with Ashman proposed usage of RF low pressure discharge on chlorine, bromine and iodine containing gases for the surface sterilization [2]. In both patents, sterilized items were placed immediately in the region of the discharge plasma generation. In patent [3], another approach to design of the device for sterilization was used: items to be processed and location of the plasma generation were spatially separated along dielectric working chamber, and the sterilization was performed by flowing afterglow argon plasma from low pressure capacitive RF discharge. Subsequent patents proposed usage of different device designs, discharge types and plasma generating media for the plasma sterilization. In patent [4] it was proposed to use the plasma excited by ultra-short laser beam for sterilization of internal surfaces of containers. It has been also shown that the use of low-pressure capacitive RF discharge plasma in oxygen provides sterilizations of B. subtilis spores on the surface of packed instruments for about 60 min [5]. Plasma of low-pressure inductive RF discharge in a working mixture, which included aromatic, heterocyclic and saturated or unsaturated acyclic aldehydes, was used for the sterilization in patent [6]. The same discharge type on hydrogen peroxide vapor was used for the sterilization in patent [7]. In patent [8], metal vacuum chamber of the sterilizer contained perforated electrode along the chamber wall, and low-pressure RF discharge on mixtures of O_2 and CF_4 was ignited between the chamber and the electrode. Processed items were located inside perforated electrode, and thus the sterilization was performed by flowing plasma from the discharge gap between the chamber wall and perforated electrode. Low-pressure microwave discharge on mixtures of nitrogen, oxygen, argon and helium was used in patents [9, 10]. The plasma generator consisted of either several MW "generator tubes" located inside sterilizing chamber [9], or a single MW plasma generator attached immediately to top wall of the chamber. Sterilization of the items located in the chamber either between "generator tubes", or below single plasma generator, was performed by flowing afterglow plasma. In mid-1990s, subsequent development of ideas stated in patents [7-10] resulted in creating the sterilization systems based on RF (Advanced Sterilization Products) and MW (AbTox Inc). plasma generators with use of plasma generating medium represented by hydrogen peroxide vapor in the first system, and mixture of hydrogen peroxide and peracetic acid vapors in the second one. Analysis shows that till the middle of 1990s, all low-pressure plasma sterilization systems were conditionally subdivided into several groups. By the design (independently on types of plasma generating media and discharges), they are: (1) "direct plasma" sterilizer, in which processed items are placed immediately in the discharge plasma; (2) "flowing afterglow plasma" one, in which locations of placement of processed items and discharge plasma generation are spatially separated. By the type of plasma generating medium, they are: (1) "true" plasma sterilizer with the medium represented by gases/gas mixtures which do not exhibit bactericidal features under normal conditions (oxygen, nitrogen, argon, etc.); (2) "plasma based" sterilizer with plasma generating medium represented by substances which exhibit bactericidal features themselves (aldehydes, hydrogen peroxide, acids and so on). In the present work, role of UV radiation of the plasma only in case of "true" plasma sterilization systems will be considered for both "direct plasma", and "flowing afterglow plasma" treatments. It is motivated by fact that in case of "true" sterilizers, UV radiation of the plasma can perform a determining (or, at least, an essential) role in the sterilization process. And in case of "plasma based" sterilizers, the main effect in the sterilization is contributed by both active species themselves, and the species formed in processes of dissociation, excitation and ionization (see, for example [11]).
机译：这篇综述专门讨论了在将物品浸入放电等离子体中（“直接等离子体”处理）和在流过余辉等离子体（“远程等离子体”）的情况下，通过放电等离子体的VUV / UV辐射对物品进行灭菌的特殊性。治疗）。还考虑了诸如紫外线照射光谱，基板温度等因素对紫外线杀菌效率的影响问题。 Menashi于1968年在专利[1]中首次提出将血浆用于灭活微生物。通过在大气压下在氩气中通过脉冲电晕放电对玻璃或塑料容器的内表面进行灭菌。结果表明，在不到0.1 s的时间内即可完成表面密度高达»6 x 105孢子/ cm2的孢子灭菌。随后，该作者与阿什曼（Ashman）一起提出了对含氯，溴和碘的气体进行射频低压放电以进行表面灭菌的方法[2]。在这两个专利中，将灭菌物品立即放置在放电等离子体产生的区域中。在专利[3]中，使用了另一种设计灭菌装置的方法：沿着电介质工作室在空间上分离待处理的物品和等离子体产生的位置，并通过从低压电容流过余辉氩等离子体来执行灭菌。射频放电。随后的专利提出了将不同的设备设计，放电类型和等离子体产生介质用于等离子体灭菌的建议。在专利[4]中，提出了使用由超短激光束激发的等离子体来对容器的内表面进行灭菌。还显示出在氧气中使用低压电容性RF放电等离子体可对包装好的器械表面的枯草芽孢杆菌孢子提供约60分钟的杀菌作用[5]。在专利[6]中，将包含芳香族，杂环和饱和或不饱和无环醛在内的工作混合物中的低压感应RF放电等离子体用于灭菌。在专利[7]中使用相同的过氧化氢蒸气排放类型进行灭菌。在专利[8]中，消毒器的金属真空腔室沿腔室壁包含穿孔电极，并且在腔室和电极之间点燃了O_2和CF_4混合物的低压RF放电。被处理物位于带孔电极的内部，因此通过使等离子体从腔室壁与带孔电极之间的放电间隙流入而进行杀菌。在专利[9，10]中使用了对氮，氧，氩和氦的混合物进行低压微波放电的方法。等离子发生器由位于灭菌室[9]内的数个兆瓦“发生器管”组成，或由一个直接附接到该室顶壁的单兆瓦等离子发生器组成。通过流过余辉等离子体，对位于“发生器管”之间或单个等离子体发生器下方的腔室内的物品进行灭菌。在1990年代中期，专利[7-10]中所述思想的后续发展导致建立了基于RF（高级灭菌产品）和MW（AbTox Inc）的灭菌系统。等离子发生器，其使用在第一系统中以过氧化氢蒸汽为代表的等离子体产生介质，在第二系统中使用过氧化氢和过乙酸蒸汽的混合物。分析表明，直到1990年代中期，所有低压等离子体灭菌系统都被有条件地分为几类。通过设计（与等离子体产生介质和放电的类型无关），它们是：（1）“直接等离子体”灭菌器，其中已处理的物品立即置于放电等离子体中； （2）“流动的余辉等离子体”，其中被处理物的放置位置和放电等离子体的产生在空间上是分开的。按等离子产生介质的类型，它们是：（1）“真正的”等离子灭菌器，其介质为在正常条件下（氧气，氮气，氩气等）不表现出杀菌特性的气体/气体混合物； （2）具有血浆产生介质的“基于血浆的”灭菌器，该血浆发生介质由本身具有杀菌特性的物质（醛，过氧化氢，酸等）代表。在目前的工作中，仅在“真正的”等离子灭菌系统的情况下，才考虑将等离子的紫外线辐射用于“直接等离子”和“流动余辉等离子”处理。实际上是出于动机，在“真正的”消毒器的情况下，等离子体的紫外线辐射可以在消毒过程中发挥决定性（或至少是必要的）作用。在“基于等离子体的”灭菌器的情况下，灭菌的主要作用是由活性物种本身以及在解离，激发和电离过程中形成的物种共同引起的（例如，参见[11]）。

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