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首页> 外文期刊>Plasma Sources Science & Technology >Modelling of a low-pressure N-2-O-2 discharge and post-discharge reactor for plasma sterilization
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Modelling of a low-pressure N-2-O-2 discharge and post-discharge reactor for plasma sterilization

机译：用于等离子体灭菌的低压N-2-O-2放电和放电后反应器的建模

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A model is used to study the afterglow of a flowing microwave discharge omega/(2 pi) = 2450 MHz, p = 667 Pa (5 Torr), in the mixture N-2-xO(2), with x = 0.7- 7% of O-2. This model considers a self-consistent kinetic description of the discharge and early-afterglow regions, followed by a 3D hydrodynamic analysis of the post-discharge chamber. The behaviour of NO( B) molecules and O(P-3) atoms is discussed in detail, since these two species play an important role in the sterilization process, respectively, due to the UV emission associated with the NO ss bands and due to erosion effects. The present work shows that a maximum in the UV emission intensity from NO ss occurs in the range 0.7-2% of O-2 added to the mixture, which is in agreement with the survival curves of spores presented by Philip et al (2002 IEEE Trans. Plasma Sci. 30 1429). In general, the oxygen atoms concentration is more important as the added O2 percentage increases. The interplay of N(S-4), O(P-3), NO(X), N-2( X, v) and NO(B) species in the overall kinetics both in the discharge and in the early-afterglow region is discussed. Particular attention is devoted to the density of NO(B) and O(P-3) in the sterilization vessel at different spatial planes and for various mixture compositions.
机译：使用模型研究混合物N-2-xO（2）中流动微波放电的余辉omega /（2 pi）= 2450 MHz，p = 667 Pa（5 Torr），x = 0.7- 7 O-2的百分比。该模型考虑了排放区和余辉早期区域的自洽动力学描述，然后是排放后室的3D流体动力学分析。 NO（B）分子和O（P-3）原子的行为进行了详细讨论，因为这两种物质分别在杀菌过程中起着重要作用，这是由于与NO ss谱带相关的紫外线发射以及侵蚀作用。目前的工作表明，从NO ss发出的紫外线发射强度的最大值出现在添加到混合物中的O-2的0.7-2％的范围内，这与Philip等人（2002 IEEE等离子科学30（1429）。通常，随着添加的O2百分比的增加，氧原子的浓度更为重要。 N（S-4），O（P-3），NO（X），N-2（X，v）和NO（B）物种在放电和余辉早期的整体动力学中的相互作用讨论区域。特别注意消毒容器中不同空间平面和各种混合物成分的NO（B）和O（P-3）的密度。

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