CONTROLLED DEPOSITION OF WEDGE-SHAPED THICKNESS PROFILES BY PULSED LASER DEPOSITION

机译：脉冲激光沉积可控制楔形厚度轮廓的沉积

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A method yielding precisely controlled thickness profiles in thin-film growth is necessary for continuous compositional spread techniques. While multiple approaches have been introduced and successfully tested, some specific applications require the use of very thin "wedge"-type profiles (～10 A at the thickest point), while at the same time yielding lateral sample sizes of several centimeters. Here we introduce the basic principles of a pulsed-laser deposition based approach utilizing the translation of the substrate behind a slit-shaped aperture and demonstrate that this method can satisfy these requirements.

机译：对于连续的成分扩散技术来说，在薄膜生长中产生精确控制厚度轮廓的方法是必需的。尽管已经引入了多种方法并成功进行了测试，但某些特定应用要求使用非常薄的“楔形”型轮廓（最厚点约为10 A），同时产生的横向样品尺寸为几厘米。在这里，我们介绍了一种利用脉冲激光沉积方法的基本原理，该方法利用了缝隙形孔后面的基板平移，并证明了该方法可以满足这些要求。

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《Proceedings vol.2003-29; Epitaxial Growth of Functional Oxides Symposium and Electrochemical Society Meeting; 20031012-17; Orlando,FL(US)》|2003年|P.125-130|共6页
会议地点 OrlandoFL(US)
作者
H.M. Christen; I. Ohkubo;
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Oak Ridge National Laboratory, Condensed Matter Sciences Division, Oak Ridge, Tennessee 37831-6056;

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正文语种 eng
中图分类材料;
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1. Large-Area Deposition of MoS2 by Pulsed Laser Deposition With In Situ Thickness Control [J] . Serna Martha I., Yoo Seong H., Moreno Salvador, ACS nano . 2016,第6期

机译：原位厚度控制的脉冲激光沉积大面积沉积MoS2
2. Controlling the Bi content, phase formation, and epitaxial nature of BiMnO_3 thin films fabricated using conventional pulsed laser deposition, hybrid pulsed laser deposition, and solid state epitaxy [J] . S. Havelia, S. Wang, M. Skowronski, Journal of Applied Physics . 2009,第12期

机译：控制使用常规脉冲激光沉积，混合脉冲激光沉积和固态外延制备的BiMnO_3薄膜的Bi含量，相形成和外延特性
3. Ultraviolet Photoresponse Properties of Single-Walled Carbon Nanotubes Decorated with Thickness-Controlled ZnO Layer by Pulsed Laser Deposition [J] . Kenta Itabashi, Hiroshi Tabata, Winadda Wongwiriyapan, Japanese journal of applied physics . 2012,第5ISSUE1期

机译：通过脉冲激光沉积装饰厚度控制的ZnO层的单壁碳纳米管的紫外光响应特性
4. CONTROLLED DEPOSITION OF WEDGE-SHAPED THICKNESS PROFILES BY PULSED LASER DEPOSITION [C] . H. M. Christen, I. Ohkubo Epitaxial Growth of Functional Oxides Symposium . 2005

机译：通过脉冲激光沉积控制楔形厚度型材的沉积
5. Synthesis of novel materials by pulsed laser deposition and chemical vapor deposition: Part I: Energetic deposition and stability of carbon nitride thin films. Part II: Catalytic growth of one dimensional materials and devices. [D] . Hu, Jiangtao. 2000

机译：通过脉冲激光沉积和化学气相沉积合成新型材料：第一部分：氮化碳薄膜的能量沉积和稳定性。第二部分：一维材料和装置的催化生长。
6. Thickness Influence on In Vitro Biocompatibility of Titanium Nitride Thin Films Synthesized by Pulsed Laser Deposition [O] . Liviu Duta, George E. Stan, Adrian C. Popa, 2016

机译：厚度对脉冲激光沉积合成氮化钛薄膜体外生物相容性的影响
7. Large Area Deposition of MoS2 by Pulsed Laser Deposition with In-Situ Thickness Control [O] . Serna Martha I., Yoo Seong H., Moreno Salvador, 2016

机译：原位厚度控制的脉冲激光沉积大面积沉积MoS2
8. Enhancement of Thickness Uniformity of Thin Films Grown by Pulsed LaserDeposition [R] . Fernandez, F. E. 1995

机译：脉冲激光沉积法制备薄膜厚度均匀性的研究

CONTROLLED DEPOSITION OF WEDGE-SHAPED THICKNESS PROFILES BY PULSED LASER DEPOSITION

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