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首页> 外文会议>Proceedings vol.2005-04; Electrochemical Society(ECS) Meeting and 42nd State-of-the-Art-Program on Compound Semiconductors(SOTAPOCS XLII) and the International Symposium on Processes at the Compound-Semiconductor/Solution Interface; 20050515-20; Quebec C >STUDY OF THE FLAT BAND POTENTIAL OF INP IN LIQUID AMMONIA: A NERNSTIAN BEHAVIOR?
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STUDY OF THE FLAT BAND POTENTIAL OF INP IN LIQUID AMMONIA: A NERNSTIAN BEHAVIOR?

机译：液氨中INP的平带势研究：能斯特行为？

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摘要

Liquid ammonia is a unique non aqueous solvent since it provides to study semiconductor interface without water molecules in the Helmholtz layer. Under these remarkable conditions, flat band potentials were studied at the interfaces p- and n-InP/liquid ammonia by capacity measurements. This study was performed in the whole range of pH referred to liquid ammonia scale (33 pH units) and a linear variation of VFB vs. pH was observed with the expected slope of 44mV/pH unit. Using XPS analyses, we demonstrated clearly that an acid-base equilibrium occurs as well on a bare surface as on an oxidized surface.
机译：液态氨是一种独特的非水性溶剂，因为它可以研究亥姆霍兹层中没有水分子的半导体界面。在这些非同寻常的条件下，通过容量测量研究了p-和n-InP /液氨界面上的平坦带电势。这项研究是在相对于液氨规模的整个pH范围（33个pH单位）中进行的，观察到VFB与pH的线性变化，预期斜率为44mV / pH单位。使用XPS分析，我们清楚地证明了酸碱平衡在裸露的表面和氧化的表面上也会发生。

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