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A SIMPLE METHOD TO MODEL NONRECTANGULAR-GATE LAYOUT IN SOI MOSFETS

机译:SOI MOSFET非矩形栅极布局建模的简单方法

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摘要

A simple method to obtain an analytical current model for nonrectangular-gate layout in SOI MOSFETs is presented, based on partition of the original layout into trapezoidal parts, and modeling these trapezoids by a closed form expression. A generic shape factor is defined for comparison between devices of different shapes in the same technology. Three-dimensional simulation and some experimental results were carried out to verify the method accurateness. The obtained expression showed good agreement both to simulation and experimental results. The method can be applied to a wide range of gate layout shapes.
机译:提出了一种基于SOI MOSFET中非矩形栅极布局的分析电流模型的简单方法,该方法基于将原始布局划分为梯形部分,并通过闭合形式的表达式对这些梯形进行建模。定义了通用形状因数,以便在同一技术中不同形状的设备之间进行比较。进行了三维仿真和一些实验结果,验证了该方法的准确性。得到的表达式与仿真和实验结果均显示出良好的一致性。该方法可以应用于各种浇口布局形状。

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