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首页> 外文会议>RIAO/OPTILAS 2004 >Optical properties of TiO_(2-x) thin films studied by spectroscopic ellipsometry: substrate temperature effect
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Optical properties of TiO_(2-x) thin films studied by spectroscopic ellipsometry: substrate temperature effect

机译：椭圆偏振光谱法研究TiO_（2-x）薄膜的光学性能：衬底温度效应

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Titanium oxide thin films were obtained by reactive de-magnetron sputtering. A target of titanium (Lesker; 99.9 % pure) and a mixture of argon and oxygen gases were used to deposit titanium oxide films onto silicon and glass substrates. The substrate temperature was varied between 200 and 400 ℃. Optical constants have been determined by spectroscopic ellipsometry and by using the optical transmittance data from UV-Vis spectrometry. The effect of substrate temperature on the optical properties is analyzed. Results indicate an increase in the refractive index of the films with substrate temperature, which is attributed to changes in the oxygen content, density and degree of crystallization of the films.
机译：通过反应性磁控溅射获得二氧化钛薄膜。使用钛靶（Lesker；纯度为99.9％）以及氩气和氧气的混合物将氧化钛膜沉积到硅和玻璃基板上。基板温度在200到400℃之间变化。光学常数已经通过椭圆偏振光谱法和使用来自UV-Vis光谱的光透射率数据确定。分析了基板温度对光学性能的影响。结果表明薄膜的折射率随基材温度的升高而增加，这归因于薄膜中氧含量，密度和结晶度的变化。

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