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Growth and characterisation of InAsN/GaAs dilute nitride semiconductor alloys for the mid-infrared spectral range

机译:InAsN / GaAs稀氮化物半导体合金在中红外光谱范围内的生长和表征

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We report the successful growth of InAsN onto GaAs substrates using nitrogen plasma source molecular beam epitaxy. We describe the spectral properties of InAsN alloys with N-content in the range 0 to 1% and photoluminescence emission in the mid-infrared spectral range. The photoluminescence emission of the sample containing 1% N reveals evidence of recombination from extended and localized states within the degenerate conduction band of InAsN. A comparison of GaAs and InAs based material shows little change in FWHM suggesting the change in substrate does not cause significant reduction in quality of the epilayers. Material grown is consistent with predictions from the band anti-crossing model (BAC model).
机译:我们报告了使用氮等离子体源分子束外延成功地将InAsN生长到GaAs衬底上。我们描述了InAsN合金的光谱特性,其中N含量在0至1%的范围内,而光致发光在中红外光谱范围内。含1%N的样品的光致发光发射揭示了InAsN简并导带中扩展态和局部态重组的证据。 GaAs和InAs基材料的比较显示FWHM几乎没有变化,表明衬底的变化不会引起外延层质量的显着降低。增长的材料与谱带反交叉模型(BAC模型)的预测一致。

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