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Dilute nitride and GaAs n-i-p-i solar cells

机译:稀氮化物和GaAs n-i-p-i太阳能电池

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摘要

We demonstrate for the first time the operation of GaInNAs and GaAs n-i-p-i doping solar cells with ion-implanted selective contacts. Multiple layers of alternate doping are grown by molecular beam epitaxy to form the n-i-p-i structure. After growth, vertical selective contacts are fabricated by Mg and Si ion implantation, followed by rapid thermal annealing treatment and fabrication into circular mesa cells. As means of characterisation, spectral response and illuminated current–voltage (I-V) were measured on the samples. The spectral response suggests that all horizontal layers are able to contribute to the photocurrent. Performance of the devices is discussed with interest in the n-i-p-i structure as a possible design for the GaInP/GaAs/GaInNAs tandem solar cell.
机译:我们首次展示了具有离子注入选择性接触的GaInNAs和GaAs n-i-p-i掺杂太阳能电池的运行。通过分子束外延生长多层交替掺杂,以形成n-i-p-i结构。生长后,通过镁和硅离子注入制造垂直选择性接触,然后进行快速热退火处理并制造成圆形台面电池。作为表征的手段,在样品上测量了光谱响应和照明电流-电压(I-V)。光谱响应表明所有水平层均能够贡献光电流。讨论了器件的性能,并以n-i-p-i结构作为GaInP / GaAs / GaInNAs串联太阳能电池的可能设计。

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