• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Society of Vacuum Coaters 46th Annual Technical Conference; May 3-8, 2003; San Francisco, California USA >New Plasma Source for Assisted Reactive Evaporation and IBAD Applications
【24h】

New Plasma Source for Assisted Reactive Evaporation and IBAD Applications

机译：辅助反应蒸发和IBAD应用的新型等离子体源

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

A new plasma source is introduced for assisting a thermal or electron beam evaporation process. The source is particularly applicable to optical film deposition processes requiring reac-tively evaporated dense coatings. The source utilizes a magnetron discharge to generate electrons inside a cathode cavity. The cathode cavity communicates with the process chamber though a nozzle and an axial magnetic field generated by a solenoid electromagnet. The solenoid field confines electrons exiting the cathode cavity by the mirror magnetic effect. Process gas is introduced into the cathode cavity and must pass through the nozzle to reach the process chamber. The result is a dense, uniform plasma that emanates through the nozzle. Because there are no filaments or sensitive low work function materials, reactive gases such as oxygen can be directly "burned" in the source. The source is presented with the theory of operation and Langmuir probe, and ion flux uniformity data.
机译：引入了新的等离子体源，以辅助热或电子束蒸发过程。该源特别适用于需要反应性蒸发致密涂层的光学薄膜沉积工艺。该源利用磁控管放电在阴极腔内产生电子。阴极腔通过喷嘴和由螺线管电磁体产生的轴向磁场与处理室连通。螺线管场通过镜面电磁效应限制离开阴极腔的电子。工艺气体被引入到阴极腔中，并且必须通过喷嘴才能到达工艺腔室。结果是通过喷嘴散发出的致密，均匀的等离子体。因为没有灯丝或敏感的低功函数材料，所以可以在源中直接“燃烧”氧气等反应性气体。给出了离子源的工作原理和Langmuir探针，以及离子通量均匀性数据。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号