• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Society of Vacuum Coaters Annual Technical Conference; 20040424-29; Dallas,TX(US) >Industrial Size High Power Impulse Magnetron Sputtering
【24h】

Industrial Size High Power Impulse Magnetron Sputtering

机译：工业尺寸大功率脉冲磁控溅射

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

High power impulse magnetron sputtering (HIPIMS) is a novel physical vapor deposition technology producing large area uniform discharges with high concentration of metal ions. Until now it has been available on cathodes with area up to 180 cm~2 (30 in~2). The present work reports on the utilization of magnetron cathodes with area of 400 cm~2 (62 in~2) to generate HIPIMS discharges in the presence of Ar. The discharge was driven at a frequency of 100 Hz (10 ms) and pulse duration of 200 μs. The peak currents were in excess of 2.5 kA when operated with a titanium target. The discharge was stable at Ar pressures down to 7 x 10~(-4) mbar (0.5 mTorr). The HIPIMS plasma composition was studied as a function of discharge current using time resolved optical emission spec-troscopy. Strong emission from Ti(2+) and Ti(1+) ions was observed. The discharge was observed to transit from Ar plasma dominated to metal ion dominated as reported previously for small cathodes. The optical emission intensity of individual species, I( Ti(1+)), varied with discharge current, Id, according to a power law I( (Ti1 +)) ～ Id~n. The exponent n was found to be 2 for Ti(2+); 1.5 for Ti(1+); and 0.5-0.8 for Ti(0). This signifies a steep dependence of highly charged metal ions on the discharge current. It also points to a strong increase in metal ion to metal neutral ratio as a function of discharge current.
机译：高功率脉冲磁控溅射（HIPIMS）是一种新颖的物理气相沉积技术，可产生具有高浓度金属离子的大面积均匀放电。到目前为止，它已可用于面积最大为180 cm〜2（30 in〜2）的阴极上。本工作报道了在Ar的存在下利用面积为400 cm〜2（62 in〜2）的磁控阴极产生HIPIMS放电的情况。以100 Hz（10 ms）的频率和200μs的脉冲持续时间驱动放电。使用钛靶时，峰值电流超过2.5 kA。在Ar压力低至7 x 10〜（-4）mbar（0.5 mTorr）时，放电稳定。使用时间分辨光发射光谱法研究了HIPIMS等离子体组成与放电电流的关系。观察到Ti（2+）和Ti（1+）离子的强烈发射。如先前对于小阴极所报道的，观察到放电从占主导的Ar等离子体过渡到占主导的金属离子。各个物种的光发射强度I（Ti（1+））随放电电流Id的变化而变化，符合幂律I（（Ti1 +））〜Id〜n。发现Ti（2+）的指数n为2。 Ti（1+）为1.5; Ti（0）为0.5-0.8。这表明高电荷金属离子对放电电流的强烈依赖性。它还指出，金属离子与金属中性比的强烈增加是放电电流的函数。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号