Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611;
Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611;
Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611;
Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611;
Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611;
Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611;
Department of Material Science and Engineering, University of Florida, Gainesville, Florida 32611;
Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, Korea;
Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, Korea;
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830;
机译:高能质子辐照对AlGaN / GaN高电子迁移率晶体管的影响
机译:栅极取向对掺Si的非极性AlGaN / GaN金属氧化物半导体高电子迁移率晶体管的dc特性的影响
机译:SiO_2,SiON和SiN作为制造AlGaN / GaN金属氧化物/绝缘体-半导体高电子迁移率晶体管的栅极绝缘体的电学特性比较
机译:原始辐射能量在AlGan / GaN金属氧化物半导体高电子迁移率晶体管中的影响研究
机译:辐照损伤对GaN基金属氧化物半导体高电子迁移率晶体管和β-GA2O3的影响
机译:质子辐照对常断型AlGaN / GaN栅嵌入式金属-绝缘体-半导体异质结构场效应晶体管随时间变化的介电击穿特性的影响
机译:新型高性能AlGaN / GaN基增强型金属氧化物半导体高电子迁移率晶体管