首页> 外文会议>Symposium on Ion Beam Synthesis and Processing of Advanced Materials held Nov 27-29, 2000, Boston, Massachusetts, U.S.A. >Synthesis of Continuous SmSi_2 Layers on Si by Samarium Ion Implantation Using A Metal Vapor Vacuum Arc Ion Source
【24h】

Synthesis of Continuous SmSi_2 Layers on Si by Samarium Ion Implantation Using A Metal Vapor Vacuum Arc Ion Source

机译:金属蒸气真空电弧离子源注入Sa离子在Si上合成连续SmSi_2层

获取原文
获取原文并翻译 | 示例

摘要

Samarium ion implantation was conducted to synthesize Sm-disilicide films on silicon wafers, using a metal vapor vacuum arc ion source and the continuous SmSi_2 films were directly obtained with neither external heating during implantation nor post-annealing. Diffraction and surface morphology analysis confirmed the formed Sm-disilicilde films were of a fine crystalline structure under appropriate experimental conditions. Besides, the formation mechanism of the SmSi_2 phase is also discussed in terms of the temperature rise caused by ion beam heating and the effect of ion dose on the properties of the SmSi_2 films.
机译:使用金属蒸汽真空电弧离子源进行离子注入以在硅片上合成Sm二硅化物膜,并且在注入过程中不进行外部加热也不进行后退火的情况下,直接获得连续的SmSi_2膜。衍射和表面形态分析证实,在适当的实验条件下,所形成的Sm-硅化物薄膜具有良好的晶体结构。此外,还从离子束加热引起的温度升高以及离子剂量对SmSi_2薄膜性能的影响等方面探讨了SmSi_2相的形成机理。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号