首页> 外文会议>Symposium on Microcrystalline and Nanocrystalline Semiconductors-1998 held November 30-December 3, 1998, Boston, Massachusetts, U.S.A. >Functionalization of porous silicon surfaces by solution-phase reactions with alcohols and grignard reagents
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Functionalization of porous silicon surfaces by solution-phase reactions with alcohols and grignard reagents

机译:通过与醇和格氏试剂的溶液相反应使多孔硅表面功能化

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This paper describes the covalent attachment of various organic molecules to the hydrogen-terminated surface of porous silicon using alcohols and Grignard reagents. With alcohols, the chemical reaction forms Si-O-C attachments to the silicon substrate and requires modest heating (40-70deg C). With Grignard reagents, the reaction proceeds at room temperature and forms a covalent film that is attached by Si-C bonds to the silicon support. Evidence for these reactions is provided by infrared and x-ray photoelectron spectroscopies.
机译:本文介绍了使用醇和格氏试剂将各种有机分子共价连接到多孔硅的氢封端表面。与醇类发生化学反应后,Si-O-C附着在硅基板上,需要适度加热(40-70℃)。使用格氏试剂,反应在室温下进行并形成共价膜,该共价膜通过Si-C键连接到硅载体上。这些反应的证据由红外和X射线光电子能谱提供。

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