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首页> 外文会议>Symposium on Multicomponent Oxide Films for Electronics held April 6-8,1999,San francisco,California,U.S.A. >Oxide film for mation on metals and aloys by thermal, elecroschemical and plasma oxidation and prediction of resulting structures
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Oxide film for mation on metals and aloys by thermal, elecroschemical and plasma oxidation and prediction of resulting structures

机译：通过热，电化学和等离子氧化在金属和合金上进行氧化的氧化膜，并预测生成的结构

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摘要

Multicomponent oxide films are needed to meet the increasing demands of the electronics industry. Three main methods that involve oxidation of a metallic substrate are thermal, anodic and plasma oxidation. Today we do not have an adequate fundamental physical -chemical model of how multicomponent oxides evolve on alloys under these oxidizing conditions to design a wide range of materials for electronic devices. The three methods will be discussed in terms of physical/chemical parameters that influence the chemical nature and structure of the resulting oxides. By using surface studies of the oxidation behavior of numerous metals and alloys we have been able to delineate the factors which are most important to the oxide formation process and provide insight into the prediction of oxide layer structures. The electrochemical processes that occur during the materials reaction with a chosen environment will be used to discuss the physical and chemical mechanisms involved. Intrinsic and extrinsic electric fields will be shown to influence the chemical and structural nature of the resulting oxide structures. Examples will be presented from a number of metla and alloy systems that have been examined in our laboratory. These include Al,Ti,Zr,Nb,Mn,Cu and Ni and some of their selected alloys. The models that have developed from these studies are providing some predictive power in how the complex oxide overlayer will be chemically speciated and on its structure.
机译：需要多组分氧化物膜来满足电子工业日益增长的需求。涉及金属基板氧化的三种主要方法是热氧化，阳极氧化和等离子体氧化。如今，我们还没有足够的基本物理化学模型来确定在这种氧化条件下多组分氧化物如何在合金上演化，从而无法设计出各种电子设备材料。将根据影响所得氧化物的化学性质和结构的物理/化学参数讨论这三种方法。通过对多种金属和合金的氧化行为进行表面研究，我们已经能够描绘出对氧化物形成过程最重要的因素，并为预测氧化物层结构提供了见识。材料与选定环境发生反应期间发生的电化学过程将用于讨论所涉及的物理和化学机理。内在和外在电场将显示出影响所得氧化物结构的化学和结构性质。我们将在实验室中测试过的多种金属和合金系统中提供示例。其中包括Al，Ti，Zr，Nb，Mn，Cu和Ni及其某些选定的合金。这些研究开发的模型为复杂氧化物覆盖层的化学形成方式及其结构提供了一定的预测能力。

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