首页> 外文会议>Symposium on Multicomponent Oxide Films for Electronics held April 6-8,1999,San francisco,California,U.S.A. >Characterization of retention phenomena of micron-size electrical domains in PZT thin films
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Characterization of retention phenomena of micron-size electrical domains in PZT thin films

机译:PZT薄膜中微米级电畴保留现象的表征

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The retention phenomena of purposely aligned micron-size domains (defined as "bits") in Pb(Zr,Ti)O_3 thin films were characterized by atomic force microscopy (AFM) combined with a lock-in amplifier. It is found that the retention loss occurs by "region by region" showing local variation of the rat eof the loss. Furthermore, the total retention loss can be successfully described by an extended exponential decay, which implies a narrow distribution of the relaxation times of the domains. This probably comes from the fact that the micron-size bits consist a few hundreds of domains. Along with the characterization, the effects of the bit size and the poling time per unit area on the retention characteristics were investigated. Based on our observations, it is concluded that the retention time is proportional to both the poling time per unit area and the bit size. This trend is successfully explained by a kinetic model develoed by our group.
机译:通过原子力显微镜(AFM)结合锁定放大器,对Pb(Zr,Ti)O_3薄膜中故意对准的微米级畴(定义为“位”)的保留现象进行了表征。发现保留损失是通过“逐个区域”发生的,显示了损失中大鼠的局部变化。此外,总的保留损耗可以通过扩展的指数衰减来成功描述,这意味着域的弛豫时间分布窄。这可能是因为微米大小的位包含数百个域。除了表征,还研究了位大小和每单位面积极化时间对保留特性的影响。根据我们的观察,可以得出结论,保留时间与单位面积的极化时间和位大小均成正比。我们小组开发的动力学模型已成功解释了这种趋势。

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