首页> 外文会议>Symposium on Optical Microstructural Characterization of Semiconductors held November 29-30, 1999, Boston, Massachusetts, U.S.A. >Study of he radiative and non-radiative recombination processes at dislocations in silicon by photoluminescence and lbic measurements
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Study of he radiative and non-radiative recombination processes at dislocations in silicon by photoluminescence and lbic measurements

机译:通过光致发光和lbic测量研究位错在硅中的辐射和非辐射复合过程

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It is well known that the sharp, room temperature luminescence emission at 1.54 mu m from dislocated silicon has set off a great interest for this material in view of its applications in the third window of optical telecommunications. For this reason the dislocation related lumineascence ins silicon addressed recently a number of investigation aimed at understanding the mechanism of light emission. The problem is still unsolved as most of the experiments done gave contradictory answers to the main questions open, which concern the intrinsic or extrinsic nature of dislocation luminescence and the effect on it of reconstruction, interaction or passivation processes, possibly assisted by metallic or non-metallic impurities.
机译:众所周知,考虑到其在光通信的第三窗口中的应用,从位错的硅以1.54μm的锐利的室温发光发射引起了对该材料的极大兴趣。由于这个原因,与位错有关的发光材料在硅中得到解决,最近进行了许多旨在了解发光机理的研究。该问题仍未解决,因为完成的大多数实验都对主要问题提出了矛盾的答案,这些主要问题涉及位错发光的内在或外在性质以及位错发光的重建,相互作用或钝化过程的影响,可能是金属或非金属的辅助金属杂质。

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