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Quantum confinement of above-band-gap transitions in Ge quantum dots

机译:Ge量子点中带隙跃迁的量子约束

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摘要

A number of research efforts have been focused on self-assembled germanium quantum dots in which indirect optical transitions take place across the band gap. However, many quaestions regarding the confined electronic state transitions of Ge quantum dots still remain unanswered. In the present report, we have depolsited ten alternating layers ofcrystalline Ge quantum dots embedded in an Al_2O_3 or an AlN matrix on sapphire substrates by pulsed laser deposition. The average dot sizes (73 A to 260 A) were controlled by the laser energy density, deposition time and substrate temperature. The spectral positions of both the E_1 and the E_2 transitions in the absorption spectra at room temperature and 77K shift toward higher energy ( DELTA EA_1 chemical bounds 1.19 eV, DELTA E_2 chemical bounds 0.57 eV) as the Ge dot size dcreases (73 A). Structural analysis using transmission electron microscopy and atomic force microscopy and the interpretation of optical absorption measurements in terms of quantum confinement of carrriers in both transition are presented.
机译:许多研究工作集中在自组装锗量子点上,其中在带隙上发生间接光学跃迁。然而,关于Ge量子点的受限电子态跃迁的许多质疑仍未得到解答。在本报告中,我们通过脉冲激光沉积在蓝宝石衬底上沉积了十个交替的Ge量子点交替层,这些交替的Ge量子点嵌入Al_2O_3或AlN矩阵中。平均点大小(73 A至260 A)由激光能量密度,沉积时间和基板温度控制。随着Ge点尺寸的减小(73 A),室温下和77K时,吸收光谱中E_1和E_2跃迁的光谱位置都向更高的能量移动(DELTA EA_1化学界为1.19 eV,DELTA E_2化学界为0.57 eV)。介绍了使用透射电子显微镜和原子力显微镜的结构分析,以及在两个跃迁中对载流子的量子限制方面的光吸收测量的解释。

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