Viewport influence on optical pyrometry and deposition process in mocvd vertical rotating discreactors

机译：视口对MOCVD垂直旋转不连续反应器中光学高温和沉积过程的影响

获取原文

获取原文并翻译 | 示例

页面导航

摘要
著录项
相似文献
相关主题

摘要

Optical access to the wafer for the in-situ process monitoring and control is a requirement for the advanced MOCVD equipment. Depending on their location and design, viewports can affect the reactor flow dynamics and temperature distribution inside the growth chamber thus ultimately affecting the depositioon process. Furthermore, deposition on the viewport can inflence the accuracy of in-situ measurements.

机译：先进的MOCVD设备要求对晶片进行光学访问以进行原位过程监控。视其位置和设计而定，视口会影响反应堆的流动动力学和生长室内部的温度分布，从而最终影响沉积过程。此外，在视口上的沉积会影响原位测量的准确性。

著录项

来源
《Symposium on Optical Microstructural Characterization of Semiconductors held November 29-30, 1999, Boston, Massachusetts, U.S.A.》|1999年|p.315-320|共6页
会议地点 Boston MA(US)
作者
Anton Prokopenko; alexander Gurary; Vadim Boguslavskiy; Jeffrey Ramer; Matthew Schurman;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
关键词

相似文献

外文文献
中文文献
专利

1. Process conditions optimization for the maximum deposition rate and uniformity in vertical rotating disc MOCVD reactors based on CFD modeling [J] . Bojan Mitrovic, Alex Gurary, William Quinn Journal of Crystal Growth . 2007,第1期

机译：基于CFD建模的垂直旋转圆盘MOCVD反应器中最大沉积速率和均匀度的工艺条件优化
2. Effect of embedding a porous medium on the deposition rate in a vertical rotating MOCVD reactor based on CFD modeling [J] . C.H. Lin, W.T. Cheng, J.H. Lee International communications in heat and mass transfer . 2009,第7期

机译：基于CFD模型的垂直旋转MOCVD反应器中嵌入多孔介质对沉积速率的影响
3. Reactor design optimization based on 3D modeling of nitrides deposition in MOCVD vertical rotating disc reactors [J] . B. Mitrovic, A. Parekh, J. Ramer, Journal of Crystal Growth . 2006,第2期

机译：基于MOCVD垂直旋转圆盘反应器中氮化物沉积3D建模的反应器设计优化
4. Viewport influence on optical pyrometry and deposition process in MOCVD vertical rotating disc reactors [C] . Anton Prokopenko, Alexander Gurary, Vadim Boguslavskiy, Symposium on optical microstructural characterization of semiconductors . 2000

机译：视口对MoCVD垂直旋转盘反应器中光学热测定和沉积过程的影响
5. Models of processes underlying the metalorganic chemical vapor deposition (MOCVD) of binary and ternary III-V semiconductors. [D] . Ingle, Nitin K. 1995

机译：二元和三元III-V半导体的金属有机化学气相沉积（MOCVD）的过程模型。
6. Metal-Organic Chemical Vapor Deposition (MOCVD) Synthesis of Heteroepitaxial Pr0.7Ca0.3MnO3 Films: Effects of Processing Conditions on Structural/Morphological and Functional Properties [O] . Dr. Maria R Catalano, Giuseppe Cucinotta, Emanuela Schilirò, 2015

机译：金属有机化学气相沉积（MOCVD）异质外延Pr0.7Ca0.3MnO3薄膜的合成：工艺条件对结构/形态和功能特性的影响
7. Modeling analysis of GaN/InGaN deposition in MOCVD vertical rotating disk reactors [O] . Kadinski L., Merai V., Parekh A., 2004

机译：MOCVD垂直旋转圆盘反应器中GaN / InGaN沉积的模型分析

Viewport influence on optical pyrometry and deposition process in mocvd vertical rotating discreactors

摘要

著录项

相似文献

相关主题

期刊订阅