首页> 外文会议>Symposiuml on Nitrides and Related Wide Band Gap Materials of the E-MRS 1998 Spring Conference, Strasbourg, France,16-19 June 1998 >MOCVD growth and characterization of AlGaInN multiple quantum well heterostructures and laser diodes
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MOCVD growth and characterization of AlGaInN multiple quantum well heterostructures and laser diodes

机译:AlGaInN多量子阱异质结构和激光二极管的MOCVD生长和表征

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摘要

We demonstrate room temperature, pulsed, current-injected operation of InGaAlN heterostructure laser diodes with mirrors fabricated by chemically assisted ion beam etching. The multiple quantum well devices were grown by organo-metallic vapor phase epitaxy on c-face sapphire substrates. The emission wavelengths of the gain-guided laser diodes were approx 400 nm. The lowest threshold current density obtained was 6 kA cm~(-2) with maximum output powers of 50 mW per facet. Optically-pumped distributed-feedback laser operation was also achieved.
机译:我们演示了InGaAlN异质结构激光二极管的室温,脉冲,电流注入操作,该二极管具有通过化学辅助离子束蚀刻制成的反射镜。通过有机金属气相外延在c面蓝宝石衬底上生长多量子阱器件。增益引导激光二极管的发射波长约为400 nm。获得的最低阈值电流密度为6 kA cm〜(-2),每面最大输出功率为50 mW。还实现了光学泵浦分布式反馈激光操作。

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