CMP AND NANO-CHARACTERIZATION OF MAGNETIC HEAD WAFER FILMS

机译：磁头晶圆薄膜的CMP和纳米表征

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Similar to the semiconductor sector improving processing power by decreasing device sizes, the information storage sector has been working to decrease device sizes in read/write heads. Chemical mechanical polishing (CMP) is a critical enabling technology for terabyte storage systems and other systems consisting of nanotechnology. A commercial CMP polisher was used, and the experimental material removal rates (MRR) are presented. Since the MRR is a function of the load, relative speed, and film hardness, a nano-indention technique was employed to characterize mechanical properties of the permalloy (NiFe) films. A basic MRR model was developed to compare to the experimental results.

机译：类似于半导体部门通过减小设备尺寸来提高处理能力，信息存储部门一直在努力减小读/写头中的设备尺寸。化学机械抛光（CMP）是太字节存储系统和其他由纳米技术组成的系统的关键启用技术。使用了商用CMP抛光机，并给出了实验材料去除率（MRR）。由于MRR是负载，相对速度和薄膜硬度的函数，因此采用纳米压痕技术来表征坡莫合金（NiFe）薄膜的机械性能。开发了基本的MRR模型以与实验结果进行比较。

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来源
《World Tribology Congress III vol.1; 20050912-16; Washington,DC(US)》|2005年|P.737-738|共2页
会议地点 WashingtonDC(US)
作者
Jonathan Garcia; Elon Terrell; C. Fred Higgs III;
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作者单位

Mechanical Engineering Department Carnegie Mellon University, Pittsburgh, PA, USA;

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原文格式 PDF
正文语种 eng
中图分类机械摩擦、磨损与润滑;
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专利

1. Processing considerations for CMP on thin-film head wafers [J] . Ming Jiang Solid state technology . 2004,第Sup期

机译：薄膜头晶圆上CMP的处理注意事项
2. The effect of thin film stress levels on CMP polish rates for PETEOS wafers [J] . John McGrath, Chris Davis, Jim McGrath Journal of Materials Processing Technology . 2003,第1a3期

机译：薄膜应力水平对PETEOS晶圆CMP抛光速率的影响
3. Lecture of magnetic thin films VI 6. Magnetic thin films for recording heads [J] . M. Naoe 日本応用磁気学会誌 . 2000,第3期

机译：磁性薄膜讲座VI 6.记录头的磁性薄膜
4. CMP AND NANO-CHARACTERIZATION OF MAGNETIC HEAD WAFER FILMS [C] . Jonathan Garcia, Elon Terrell, C. Fred Higgs III World Tribology Congress . 2005

机译：CMP和磁头晶片膜的纳米表征
5. Micromagnetic modeling of thin film write heads for magnetic recording. [D] . Mao, Chris Yuhong. 2000

机译：用于磁记录的薄膜写入头的微磁建模。
6. Ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc used as protective overcoats of heat-assisted magnetic recording heads [O] . J. Matlak, K. Komvopoulos -1

机译：通过过滤阴极真空电弧合成的超薄无定形碳膜用作热辅助磁记录头的保护层
7. A Study on the Within Wafer Non-uniformity of Oxide Film in CMP [O] . Ki-Hyun Park, Jae-Woo Jung, Boum-Young Park, 2005

机译：CMP中氧化膜晶片不均匀性的研究
8. Importance of wafer flatness for CMP and lithography [R] . Yuan Zhang, Lucian Wagner, Peter Golubtsov 1997

机译：用于Cmp和光刻的晶片平坦度的重要性

CMP AND NANO-CHARACTERIZATION OF MAGNETIC HEAD WAFER FILMS

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