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Direction dependent electrical and optical properties of gallium nitride nanowires.

机译:方向相关的氮化镓纳米线的电学和光学特性。

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摘要

Gallium Nitride (GaN), due to its anisotropic and polar nature, exhibits direction dependent properties. Thus controlling the growth direction of GaN nanowires and studying its properties is important for practical applications. A direct nitridation scheme was used for the controlled synthesis of GaN nanowires in two distinct directions, and direction using amorphous substrate. A simple procedure based on homoepitaxy was used to determine the growth direction of the resulting nanowires. It was observed that homoepitaxy onto the wires grown in direction resulted in microprismatic island growth at the ends while homoepitaxy onto wires grown in the direction resulted in the formation of two dimensional microbelts. This work on synthesis was previously done and reported.;In this thesis, individual GaN nanowire (NW) field effect transistors (FETs) were fabricated using the as-synthesized nanowires in two distinct directions and their direction dependent electrical and optical properties were studied. Gate dependent electrical transport measurements performed on the devices fabricated using the a-axis nanowires have shown an increase in conductivity with the applied gate voltage, while no gate dependent conductivity is observed in the devices fabricated using the 'c' axis nanowires. The electron carrier density and electron mobility for the a-direction GaN nanowire FETs is estimated to be 2*1018cm-3 and 170cm 2/V-s.;Resistance measurements performed on these devices have shown that the 'a' axis nanowires are usually low resistive (usually in the order of hundreds of KΩ's) when compared to 'c' axis nanowires which are highly resistive (order of GΩ's) Resistances of the devices were also measured by varying the length between the contacts. Observation showed that the resistance dropped down tremendously in the case of c-axis nanowires from GΩ's to KΩ's, but in the case of a-axis nanowires such a tremendous drop in the resistance was not observed. It was observed to decrease linearly in the case of a-axis nanowires. The non gate dependent conductivity and high resistance observed in c-axis nanowires is attributed to the stacking faults present in these nanowires. A theoretical model has been used to support this assumption.;This thesis also presents optical characterization of the as-synthesized nanowires. Raman spectroscopy, photoluminescence, photoconductivity and ultra violet (UV) visible absorption measurements on the samples containing a- and c-axis nanowires have shown that bandgap of the nanowires grown along the a-axis blue shifts by about 45-70meV compared to the nanowires grown along c-axis.
机译:氮化镓(GaN)由于其各向异性和极性性质,具有与方向相关的特性。因此,控制GaN纳米线的生长方向并研究其性质对于实际应用很重要。直接氮化方案用于在两个不同方向上以及使用非晶衬底的方向上可控合成GaN纳米线。使用基于均质外延的简单程序来确定所得纳米线的生长方向。观察到,沿方向生长的金属丝上的均质外延导致末端的微棱晶岛生长,而沿方向生长的金属丝上的均质外生均导致二维微带的形成。这项合成工作以前已经完成并报道。在使用a轴纳米线制造的器件上执行的与栅极相关的电传输测量结果显示,随着施加的栅极电压,电导率增加,而在使用“ c”轴纳米线制造的器件中未观察到与栅极相关的电导率。估计a方向GaN纳米线FET的电子载流子密度和电子迁移率分别为2 * 1018cm-3和170cm 2 / Vs。在这些器件上进行的电阻测量表明,“ a”轴纳米线通常是低电阻的与具有高电阻(GΩ数量级)的“ c”轴纳米线相比(通常为数百KΩ数量级),还通过改变触点之间的长度来测量器件的电阻。观察表明,在c轴纳米线从GΩ到KΩ的情况下,电阻极大地下降,但是在a轴纳米线的情况下,没有观察到电阻的极大下降。观察到在a轴纳米线的情况下线性降低。在c轴纳米线中观察到的与栅极无关的电导率和高电阻归因于这些纳米线中存在的堆叠缺陷。理论模型已被用于支持该假设。本论文还提出了合成纳米线的光学表征。在包含a轴和c轴纳米线的样品上进行的拉曼光谱,光致发光,光电导和紫外(UV)可见吸收测量表明,与纳米线相比,沿a轴生长的纳米线的带隙蓝移约45-70meV。沿c轴增长。

著录项

  • 作者

    Makkena, Rahul.;

  • 作者单位

    University of Louisville.;

  • 授予单位 University of Louisville.;
  • 学科 Engineering Chemical.;Engineering Electronics and Electrical.
  • 学位 M.S.
  • 年度 2006
  • 页码 81 p.
  • 总页数 81
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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