• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文学位 >A transient, three-dimensional numerical study of chemical vapor deposition in batch reactors.
【24h】

A transient, three-dimensional numerical study of chemical vapor deposition in batch reactors.

机译：间歇式反应器中化学气相沉积的瞬态三维数值研究。

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

A time-accurate model of multicomponent reacting flow with homogeneous and heterogeneous chemical reactions was developed to simulate the transport phenomena, gas-phase chemistry, and deposition profiles in constant-volume chemical vapor deposition reactors with arbitrarily complex geometry in two or three dimensions. A fully rigorous multicomponent gas transport model including thermal diffusion was used. A transformation was applied to the matrix of ordinary diffusion coefficients to form a matrix of effective ordinary diffusion coefficients. This transformation permitted a decoupling of the species continuity equations from one another. A first-order, time-accurate splitting procedure was used to integrate the species and energy equations, which were stiff due to terms arising from the homogeneous and heterogeneous chemical reactions. The stiff equations were solved with the CVODE library. A variable-density projection method was used to solve the variable-property momentum equations. The partial differential equations describing the model were discretized using a conservative finite difference method implemented on overset grids. The overset method was used to obtain solutions on arbitrarily complex geometrical domains. A computer code was developed using the OVERTURE object-oriented class library. The CHEMKIN library was used to compute thermodynamic properties of multi-component mixtures of ideal gases and homogeneous reaction rates. The CHEMKIN TRANSPORT library was used to compute multi-component transport properties. The SURFACE CHEMKIN library was used to compute the heterogeneous reaction rates. Numerical simulations included natural convection in two-dimensional horizontal and tilted reactors, chemical vapor deposition in a three-dimensional reactor with a heterogeneous chemistry, chemical vapor deposition in a two-dimensional reactor with moderately complex homogeneous and heterogeneous chemistry, and a CPU timing study with a system with a complicated homogeneous and heterogeneous reaction model. Results indicated that the solver obtained accurate solutions in CVD batch systems having complicated homogeneous and heterogeneous reaction models for both small and moderate Rayleigh number flows.
机译：建立了具有均相和非均相化学反应的多组分反应流的时间精确模型，以模拟在二维或三维中任意复杂几何形状的恒定体积化学气相沉积反应器中的传输现象，气相化学和沉积分布。使用了包括热扩散在内的完全严格的多组分气体传输模型。将变换应用于普通扩散系数的矩阵以形成有效普通扩散系数的矩阵。这种转换允许物种连续性方程相互解耦。一阶，时间精确的分裂过程被用来整合物种和能量方程，由于均相和非均相化学反应产生的项，这些方程和模型变得僵硬。用CV ODE 库求解这些刚性方程。用变密度投影法求解了变质动量方程。描述模型的偏微分方程使用在过剩网格上实施的保守有限差分法离散化。覆盖法用于获得任意复杂几何域上的解。使用O VERTURE 面向对象的类库开发了计算机代码。 C HEMKIN 库用于计算理想气体和均相反应速率的多组分混合物的热力学性质。 C HEMKIN T RANSPORT 库用于计算多组分传输性质。使用S URFACE C HEMKIN 库计算异构反应速率。数值模拟包括二维水平和倾斜反应器中的自然对流，具有异质化学性质的三维反应器中的化学气相沉积，具有中等复杂的均质和异质化学性质的二维反应器中的化学气相沉积以及CPU时序研究系统具有复杂的均质和异质反应模型。结果表明，该求解器在具有复杂的均质和异质反应模型的CVD批处理系统中获得了精确的解决方案，适用于中小瑞利流。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号