首页> 外文学位 >Implementation of aluminum gallium nitride/gallium nitride based high electron mobility transistor on ferroelectric materials for multi-functional optoelectronic-acoustic-electronic applications.
【24h】

Implementation of aluminum gallium nitride/gallium nitride based high electron mobility transistor on ferroelectric materials for multi-functional optoelectronic-acoustic-electronic applications.

机译:基于铁铝材料的氮化铝镓/氮化镓基高电子迁移率晶体管在多功能光电子声电子应用中的实现。

获取原文
获取原文并翻译 | 示例

摘要

This dissertation shows the properties of lithium niobate and lithium tantalate as a promising substrate for Ill-nitrides, addresses several problems of integrating compound semiconductor materials on LN and LT. It also suggests some solutions of the addressed problems, including furnace anneals at high temperature. While this furnace anneal improved surface smoothness and 111-nitride film adhesion, it also caused the repolarization on the congruent LN (48.39 mole % of Li2O) samples. However, the repolarization was not developed in the stoichiometric LN (49.9 mole % of Li2O) samples during the identical thermal treatment. Also, the structural quality of GaN epitaxial layers showed slight improvement when grown on LT substrates over LN substrates. Conventional epitaxial growth technologies were adapted and modified to implement a successful AlGaN/GaN heterostructure on LN (LT). The heterostructure were analyzed to verify the electrical and material properties using several characterization techniques. Finally, it demonstrates AlGaN/GaN-based HEMT devices on ferroelectric materials that will allow the future development of the multifunctional electrical and optical applications.
机译:本文证明了铌酸锂和钽酸锂作为III族氮化物有前途的衬底的性能,解决了在LN和LT上集成化合物半导体材料的几个问题。它还提出了解决这些问题的一些解决方案,包括高温下的炉子退火。虽然该炉退火改善了表面光滑度和111氮化物膜的附着力,但也引起了全LN(Li2O的48.39摩尔%)样品的重新极化。但是,在相同的热处理过程中,化学计量的LN(49.9摩尔%的Li2O)样品中未发生复极化。同样,当在LN衬底上的LT衬底上生长时,GaN外延层的结构质量显示出轻微的改善。对传统的外延生长技术进行了修改和修改,以在LN(LT)上成功实现AlGaN / GaN异质结构。使用几种表征技术对异质结构进行了分析,以验证电学和材料性能。最后,它演示了在铁电材料上基于AlGaN / GaN的HEMT器件,这将推动多功能电气和光学应用的未来发展。

著录项

  • 作者

    Lee, Kyoung-Keun.;

  • 作者单位

    Georgia Institute of Technology.;

  • 授予单位 Georgia Institute of Technology.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 182 p.
  • 总页数 182
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号