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Analysis, design, and applications of subwavelength diffraction gratings.

机译：亚波长衍射光栅的分析，设计和应用。

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摘要

Microelectronics fabrication techniques have now reached the point where gratings with sub-micron periodicity can be made reliably; this trend will continue, with lithographic critical dimensions shrinking to 70nm by 2010. Gratings with such small periods generally have all diffracted orders cut off for visible and IR radiation, and are labeled "subwavelength gratings". Subwavelength gratings exhibit several properties of potential use to the diffractive optics designer. Firstly, subwavelength gratings typically behave as layers of uniaxial material, with designable principal indices of refraction; this property allows for the design of broadband wide field-of-view matching layers and wave-retarders for high-index and lossy materials. Secondly, properly designed subwavelength gratings will exhibit abrupt reflectance/transmittance scattering resonances which have been proposed for use as narrowband and broadband frequency selective surfaces.; The thesis begins with a presentation of modeling and design techniques for subwavelength gratings. Modeling of subwavelength gratings via effective medium theories is examined, and the efficacies of such theories are determined by comparison to rigorous electromagnetic theory. One of these effective medium theories is then used as a tool to design antireflection surfaces and phase retarders in semiconductor materials. Next, the physical mechanism underlying the resonance phenomenon in subwavelength gratings is explored, with attention paid to the poorly understood normal incidence case; in the case of strongly modulated gratings, new and useful resonant behaviors are demonstrated. Following this, a fabrication process is described that can be used to produce semiconductor gratings with deep submicron periodicity. Finally, measurements of a silicon antireflection grating provide experimental verification of the subwavelength grating effective medium property.
机译：现在，微电子制造技术已经可以可靠地制造出亚微米周期性的光栅。这种趋势将继续下去，到2010年，光刻的关键尺寸将缩小到70nm。具有如此短周期的光栅通常会切断可见光和IR辐射的所有衍射级，并标记为“亚波长光栅”。亚波长光栅展现出衍射光学设计者可能使用的几种特性。首先，亚波长光栅通常表现为具有可设计主折射率的单轴材料层。此属性允许设计用于宽折射率和有损耗材料的宽带宽视场匹配层和慢波延迟器。其次，适当设计的亚波长光栅将表现出陡峭的反射/透射散射共振，已提出将其用作窄带和宽带频率选择表面。本文首先介绍了亚波长光栅的建模和设计技术。通过有效的介质理论对亚波长光栅的建模进行了研究，并通过与严格的电磁理论进行比较来确定这些理论的效率。这些有效的介质理论之一随后被用作设计半导体材料中的防反射表面和相位延迟器的工具。接下来，探讨了亚波长光栅共振现象的物理机制，并关注了对法线入射情况了解不多的情况。在强调制光栅的情况下，展示了新的有用的共振行为。此后，描述了可用于生产具有深亚微米周期性的半导体光栅的制造工艺。最后，硅抗反射光栅的测量提供了对亚波长光栅有效介质特性的实验验证。

著录项

  • 作者

    Brundrett, David L.;

  • 作者单位

    Georgia Institute of Technology.;

  • 授予单位 Georgia Institute of Technology.;
  • 学科 Physics Optics.; Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1997
  • 页码 160 p.
  • 总页数 160
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光学;无线电电子学、电信技术;
  • 关键词

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