• 主题
高级搜索  >
历史搜索 清空历史
首页> 中文期刊> 《物理学报》 >等离子增强原子层沉积低温生长GaN薄膜

等离子增强原子层沉积低温生长GaN薄膜

         
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Metalorganic chemical vapour deposition and molecular beam epitaxy have already been demonstrated to be suc-cessful techniques for obtaining high-quality epitaxial GaN layers with low impurity concentrations and pretty good electrical properties. However, high growth temperature employed in both of these methods give rise to some intrinsic defects of the thin films, such as high background-carrier concentrations. As a low-temperature thin film deposition method, plasma-enhanced atomic layer deposition (PE-ALD) has more unique advantages compared to both methods for epitaxial growth of GaN. In this paper, the polycrystalline GaN thin films were fabricated on Si (100) substrates at 150–300 ℃ by PE-ALD. Trimethylgallium and N2/H2 plasma gas mixture were used as the Ga and N precursors. The growth rate of the thin films was demonstrated by the spectroscopic ellipsometer. The crystal structrue and composi-tion of the GaN thin films were characterized by X-ray diffractometer and X-ray photoelectron spectrometer (XPS). It is showed that the growth window for PE-ALD grown GaN thin films is 210–270 ℃, where the growth rate remains constant at 0.70 ?/cycle. And it is known that it is the self-limiting nature of PE-ALD that is ascribed to the plateau of the growth rate. Films grown at relatively higher temperature are polycrystalline with a hexagonal wurtzite structure, while films grown under relatively lower temperature are amorphous. The grazing incidence X-ray diffraction (GIXRD) patterns of the polycrystalline thin films reveal three main peaks located at 2θ=32.4?, 34.6? and 36.9?, which are cor-responding to the (100), (002) and (101) reflections. It is showed that the Ga, N atoms would get higher energy for more effective migration to positions with lowest energy to form ordered crystalline arrange at higher growth temperature. The XPS results show that all the N elements of the as-grown thin films are in the form of N—Ga bond, indicating that all the N elements are formed into GaN thin films; and there is a little amount of the Ga elements that exist in Ga—O bond. The fact that there is no Ga2O3-related peaks in the GIXRD pattern suggests that there is small amount of amorphous Ga2O3 dispersed in the polycrystalline GaN thin films. In the future work, reducing the concentration of the C and O impurities may be achieved by increasing the time of the reaction and plasma pules in the process formula and replacing the inductively coupled plasma with the hollow cathode plasma, respectively.%采用等离子增强原子层沉积技术在低温下于单晶硅衬底上成功生长了GaN多晶薄膜,利用椭圆偏振仪、低角度掠入射X射线衍射仪、X射线光电子能谱仪对薄膜样品的生长速率、晶体结构及薄膜成分进行了表征和分析.结果表明,等离子增强原子层沉积技术生长GaN的温度窗口为210—270℃,薄膜在较高生长温度下呈多晶态,在较低温度下呈非晶态;薄膜中N元素与大部分Ga元素结合成N—Ga键生成GaN,有少量的Ga元素以Ga—O键存在,多晶GaN薄膜含有少量非晶态Ga2 O3.

著录项

  • 来源
    《物理学报》 |2017年第9期|334-340|共7页
  • 作者

    汤文辉; 刘邦武; 张柏诚; 李敏; 夏洋;

  • 作者单位

    山东科技大学材料科学与工程学院, 青岛 266000;

    中国科学院微电子研究所, 微电子设备技术研究室, 北京 100029;

    中国科学院嘉兴微电子仪器与设备工程中心, 嘉兴 314006;

    中国科学院微电子研究所, 微电子设备技术研究室, 北京 100029;

    中国科学院嘉兴微电子仪器与设备工程中心, 嘉兴 314006;

    山东科技大学材料科学与工程学院, 青岛 266000;

    中国科学院微电子研究所, 微电子设备技术研究室, 北京 100029;

    中国科学院嘉兴微电子仪器与设备工程中心, 嘉兴 314006;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类
  • 关键词

    等离子增强原子层沉积; 氮化镓; 低温沉积;

相似文献

  • 中文文献
  • 外文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号