Cu nanowire array targets have been fabricated with anodic aluminum oxide(AAO) template by pulsed electrodeposition, and characterized by scanning electron microscopy(SEM), energy-dispersive X-ray spectroscopy(EDS) and X-ray diffraction(XRD). It is found that the mean diameter of Cu nanowires is larger than the mean pore size of AAO template by 32％,and the length is shortened by 5 ％ after the removal of the template. The specimen after a deposition time of 2 000 s was characterized for length distribution of Cu nanowires. The length of Cu nanowires increases as the distance to the center of the template increases. The production of Cu Kα photons from the interaction of ultrashort pulse laser with the targets was measured. It becomes larger with the mean length of Cu nanowires increasing from 18 to 33 μm and then smaller with it increasing from 33 to 50 μm.%采用多孔阳极氧化铝(AAO)模板脉冲电沉积法制备了强辐射源用铜纳米线阵列靶,并用扫描电子显微镜(SEM)、能谱(EDS)和X射线衍射(XRD)对其进行了结构表征.结果表明:去除AAO模板后铜纳米线平均直径比去除AAO模板前的平均孔径大32%,长度缩短5%.对电沉积2000 s的样品进行铜纳米线长度分布表征,结果显示:距离模板圆心越远,铜纳米线越长.与超短脉冲激光相互作用实验结果表明:纳米线平均长度在18～50 μm范围内,铜Kα光子产额先随纳米线长度增加而增加,当长度大于33 μm时,铜Kα光子产额开始下降.
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