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Chemical Mechanical Planarization and Old Italian Violins

机译:化学机械平面化和古意大利小提琴

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摘要

Previous studies have shown that spectral analysis based on force data can elucidate fundamental physical phenomena during chemical mechanical planarization (CMP). While it has not been literally described elsewhere, such analysis was partly motivated by modern violinmakers and physicists studying Old Italian violins, who were trying to discover spectral relations to sound quality. In this paper, we draw parallels between violins and CMP as far as functionality and spectral characteristics are concerned. Inspired by the de facto standard of violin testing via hammer strikes on the base edge of a violin’s bridge, we introduce for the first time, a mobility plot for the polisher by striking the wafer carrier head of a CMP polisher with a hammer. Results show three independent peaks that can indeed be attributed to the polisher’s natural resonance. Extending our study to an actual CMP process, similar to hammered and bowed violin tests, at lower frequencies the hammered and polished mobility peaks are somewhat aligned. At higher frequencies, peak alignment becomes less obvious and the peaks become more isolated and defined in the case of the polished wafer spectrum. Lastly, we introduce another parameter from violin testing known as directivity, Δ, which in our case, we define as the ratio of shear force variance to normal force variance acquired during CMP. Results shows that under identical polishing conditions, Δ increases with the polishing removal rate.
机译:先前的研究表明,基于力数据的光谱分析可以阐明化学机械平面化(CMP)过程中的基本物理现象。尽管没有在其他地方进行字面上的描述,但这种分析部分是由现代小提琴制造商和物理学家研究古老的意大利小提琴推动的,他们试图发现与音质的频谱关系。在本文中,就功能和光谱特性而言,我们在小提琴和CMP之间进行了比较。受到事实上的小提琴测试标准的启发,即通过在小提琴琴桥的基础边缘上敲击锤子,我们首次通过用锤子敲打CMP抛光机的晶圆托架头,为抛光机引入了一个移动性图。结果显示了三个独立的峰,这些峰确实可以归因于抛光师的自然共振。将我们的研究扩展到实际的CMP工艺,类似于锤击和拉弓的小提琴测试,在较低的频率下,锤击和抛光的迁移率峰有些对齐。在较高的频率下,在抛光晶片光谱的情况下,峰的对准变得不那么明显,并且峰变得更加分离和清晰。最后,我们从小提琴测试中引入了另一个参数,称为方向性Δ,在本例中,我们将其定义为CMP过程中获得的剪切力变化与法向力变化之比。结果表明,在相同的抛光条件下,Δ随抛光去除率的增加而增加。

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