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Detachment Lithography of Photosensitive Polymers: A Route to Fabricating Three-Dimensional Structures

机译：感光性聚合物的拆离光刻：制造三维结构的途径。

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摘要

A technique to create arrays of micrometer-sized patterns of photosensitive polymers on the surface of elastomeric stamps and to transfer these patterns to planar and nonplanar substrates is presented. The photosensitive polymers are initially patterned through detachment lithography (DL), which utilizes the difference in adhesion forces to induce the mechanical failure in the film along the edges of the protruded parts of the mold. A polydimethylsiloxane (PDMS) stamp with a kinetically and thermally adjustable adhesion and conformal contact can transfer the detached patterns to etched or curved substrates, as well as planar ones. These printed patterns remain photochemically active for further modification via photolithography, and/or can serve as resists for subsequent etching or deposition, such that photolithography can be used on highly nonconformal and nonplanar surfaces. Various 3D structures fabricated using the process have potential applications in MEMS (micro-electromechanical systems) sensors/actuators, optical devices, and microfluidics.
机译：提出了一种在弹性体压模的表面上创建微米级感光聚合物图案阵列并将这些图案转移到平面和非平面基材上的技术。首先通过分离光刻法（DL）对光敏聚合物进行构图，该方法利用粘附力的差异在膜中沿模具突出部分的边缘引起机械故障。聚二甲基硅氧烷（PDMS）压模具有动态和热可调的粘合力和共形接触，可以将分离的图案转移到蚀刻或弯曲的基材以及平面基材上。这些印刷的图案保持光化学活性，以通过光刻进一步修饰，和/或可以用作抗蚀剂以用于随后的蚀刻或沉积，从而可以在高度不整形和不平坦的表面上使用光刻。使用该工艺制造的各种3D结构在MEMS（微机电系统）传感器/执行器，光学设备和微流体技术中具有潜在的应用。

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  • 来源
    《Advanced Functional Materials》 |2010年第2期|289-295|共7页
  • 作者

    Junghoon Yeom; Mark A. Shannon;

  • 作者单位

    Department of Mechanical Science and Engineering University of Illinois Urbana, IL, 61801 (U.S.A.);

    Department of Mechanical Science and Engineering University of Illinois Urbana, IL, 61801 (U.S.A.);

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