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首页> 外文期刊>Advanced Functional Materials >Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns
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Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns

机译：纳米压印平版印刷术和粘弹性在模型聚苯乙烯图案中残余应力的产生中的作用

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摘要

Understanding polymer deformation during the nanoimprinting process is key to achieving robust polymer nanostructures. Information regarding this process can be extracted from monitoring the decay of the imprinted polymer patterns during thermal annealing. In the present work, the effect of both the molar mass and the imprinting temperature on the pattern decay behavior during thermal annealing is investigated. Previously, it was found that the decay rate is fastest for a highly entangled polymer due to the elastic recovery caused by the residual stress created during the imprinting process. The present paper demonstrates that this residual stress level can be modified through control of the imprinting temperature. These results are contrasted with those for an unentangled polymer over a similar range of imprinting temperatures, where it is found that the pattern decay is controlled by simple Newtonian flow. In particular, the pattern decay is well described by surface-tension-driven viscous flow, and no imprinting-temperature effect is observed during thermal annealing. It is shown that the stability of the film against pattern decay can be optimized for moderately entangled polymer films. This effect is attributed to the competition between the effect of increased viscosity with increasing molar mass and increased residual stresses with entanglements. These observations provide guidance for the optimization of imprinting process in terms of selection of molar mass and processing temperatures.
机译：了解纳米压印过程中的聚合物变形是获得坚固的聚合物纳米结构的关键。可以通过监视热退火过程中压印的聚合物图案的衰减来提取有关此过程的信息。在目前的工作中，研究了摩尔质量和压印温度对热退火过程中图案衰减行为的影响。以前，已经发现，由于在压印过程中产生的残余应力所引起的弹性恢复，对于高度纠缠的聚合物，衰减速率最快。本文证明，可以通过控制压印温度来修改此残余应力水平。这些结果与在类似的压印温度范围内未缠结的聚合物的结果相反，在该温度范围内发现图案衰减是由简单的牛顿流控制的。特别地，通过表面张力驱动的粘性流很好地描述了图案衰减，并且在热退火期间未观察到压印温度效应。结果表明，对于适度缠结的聚合物膜，可以优化膜对图案衰减的稳定性。该效应归因于粘度随摩尔质量增加而增加的作用与缠结而引起的残余应力增加之间的竞争。这些观察结果为选择摩尔质量和加工温度方面的压印工艺提供了指导。

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