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首页> 外文期刊>Advanced Functional Materials >Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication
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Patterned self-assembled monolayers on silicon oxide prepared by nanoimprint lithography and their applications in nanofabrication

机译：纳米压印光刻技术在氧化硅上构图的自组装单分子膜及其在纳米加工中的应用

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摘要

Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.
机译：纳米压印光刻（NIL）用作在硅基板上对自组装单层（SAM）进行图案化的工具，因为它具有在微米和纳米范围内进行图案化的能力。聚合物模板充当物理屏障，可防止在基材的覆盖区域中形成SAM。除去聚合物后，获得SAM图案。在各种纳米加工方案中显示了该方法的多功能性。用第二种类型的硅烷吸附剂对基材进行功能化。通过羧酸盐官能化颗粒的选择性静电附着实现了图案增强。 NIL图案化基材的进一步应用包括粒子的模板定向吸附，以及在SAM顶部制造电极。

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