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首页> 外文期刊>Applied Optics >Zone-boundary optimization for direct laser writing of continuous-relief diffractive optical elements
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Zone-boundary optimization for direct laser writing of continuous-relief diffractive optical elements

机译：直接激光写入连续浮雕衍射光学元件的区域边界优化

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摘要

Enhancing the diffraction efficiency of continuous-relief diffractive optical elements fabricated by direct laser writing is discussed. A new method of zone-boundary optimization is proposed to correct exposure data only in narrow areas along the boundaries of diffractive zones. The optimization decreases the loss of diffraction efficiency related to convolution of a desired phase profile with a writing-beam intensity distribution. A simplified stepped transition function that describes optimized exposure data near zone boundaries can be made universal for a wide range of zone periods. The approach permits a similar increase in the diffraction efficiency as an individual-pixel optimization but with fewer computation efforts. Computer simulations demonstrated that the zone-boundary optimization for a 6 (mu)m period grating increases the efficiency by 7percent and 14.5percent for 0.6 (mu)m and 1.65 (mu)m writing-spot diameters, respectively. The diffraction efficiency of as much as 65percent-90percent for 4-10 (mu)m zone periods was obtained experimentally with this method.
机译：讨论了提高通过直接激光写入制造的连续浮雕型衍射光学元件的衍射效率。提出了一种新的区域边界优化方法，以仅在沿衍射区域边界的狭窄区域内校正曝光数据。该优化降低了与所需相位分布与写入光束强度分布的卷积相关的衍射效率的损失。描述区域边界附近的优化曝光数据的简化的逐步过渡函数可以在广泛的区域周期内通用。该方法允许与单个像素优化类似地增加衍射效率，但需要较少的计算工作。计算机仿真表明，对于6 µm周期光栅的区域边界优化，对于0.6 µm和1.65 µm写入点直径，其效率分别提高了7％和14.5％。用这种方法实验获得了在4-10μm区域周期内高达65％-90％的衍射效率。

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