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首页> 外文期刊>Applied Physics Letters >Thermal stability of the deep ultraviolet emission from AlGaN/AlN Stranski-Krastanov quantum dots
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Thermal stability of the deep ultraviolet emission from AlGaN/AlN Stranski-Krastanov quantum dots

机译:AlGaN / AlN Stranski-Krastanov量子点发出的深紫外线的热稳定性

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We report on the structural and optical properties of AlGaN/AlN quantum dot (QD) superlattices synthesized by plasma-assisted molecular-beam epitaxy. Modifying the composition and geometry of the QDs, the peak emission wavelength can be shifted from 320 nm to 235 nm while keeping the internal quantum efficiency larger than 30%. The efficient carrier confinement is confirmed by the stability of the photoluminescence (PL) intensity and decay time, from low temperature up to 100 K. Above this threshold, the PL intensity decreases and the radiative lifetime increases due to carrier thermalization. We also identified the intraband electronic transition between the ground level of the conduction band and the first excited state confined along the growth axis (s-pz).
机译:我们报告了通过等离子体辅助分子束外延合成的AlGaN / AlN量子点(QD)超晶格的结构和光学性质。通过改变量子点的组成和几何形状,可以将峰值发射波长从320 nm转换为235 nm,同时保持内部量子效率大于30%。从低温到100 K,光致发光(PL)强度和衰减时间的稳定性证实了有效的载流子限制。由于载流子的热化,在此阈值以上,PL强度下降,辐射寿命延长。我们还确定了导带的地平面和沿生长轴(s-pz)限制的第一个激发态之间的带内电子跃迁。

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