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Effect of nanoconfinement on the sputter yield in ultrathin polymeric films: Experiments and model

机译：纳米限制对超薄聚合物薄膜溅射产量的影响：实验和模型

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This fundamental contribution on secondary ion mass spectrometry (SIMS) polymer depth-profiling by large argon clusters investigates the dependence of the sputter yield volume (Y) on the thickness (d) of ultrathin films as a function of the substrate nature, i.e. hard vs soft. For this purpose, thin films of polystyrene (PS) oligomers (similar to 4,000 amu) are spin-coated, respectively, onto silicon and poly (methyl methacrylate) supports and, then, bombarded by 10 keV Ar-3000(+) ions. The investigated thickness ranges from 15 to 230 nm. Additionally, the influence of the polymer molecular weight on Y(d) for PS thin films on Si is explored. The sputtering efficiency is found to be strongly dependent on the overlayer thickness, only in the case of the silicon substrate. A simple phenomenological model is proposed for the description of the thickness influence on the sputtering yield. Molecular dynamics (MD) simulations conducted on amorphous films of polyethylene-like oligomers of increasing thickness (from 2 to 20 nm), under comparable cluster bombardment conditions, predict a significant increase of the sputtering yield for ultrathin layers on hard substrates, induced by energy confinement in the polymer, and support our phenomenological model. (C) 2018 Elsevier B.V. All rights reserved.
机译：大氩团簇对二次离子质谱（SIMS）聚合物深度剖析的基本贡献研究了溅射屈服量（Y）对超薄膜厚度（d）的依赖关系，即衬底性质的影响，即硬质对柔软的。为此，将聚苯乙烯（PS）低聚物薄膜（约4,000 amu）分别旋涂到硅和聚（甲基丙烯酸甲酯）载体上，然后用10 keV Ar-3000（+）离子轰击。研究的厚度范围为15至230 nm。此外，探讨了聚合物分子量对Si上PS薄膜的Y（d）的影响。发现仅在硅基板的情况下，溅射效率强烈取决于覆盖层厚度。提出了一个简单的现象学模型来描述厚度对溅射产量的影响。在可比的团簇轰击条件下，对厚度不断增加（从2到20 nm）的类似聚乙烯的低聚物的非晶膜进行的分子动力学（MD）模拟预测，由于能量的诱导，硬质基底上超薄层的溅射产率将显着提高。限制在聚合物中，并支持我们的现象学模型。 （C）2018 Elsevier B.V.保留所有权利。

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