机译:通过脉冲激光沉积生长可控制形态和织构的硒化铋薄膜的热电性能
Department of Materials Science and Engineering. National Chiao Tung University, Hsinchu, 30049, Taiwan, ROC;
Department of Materials Science and Engineering, National Tsing-Hua University, Hsinchu, 30013, Taiwan, ROC;
Department of Electrophysics, National Chiao Tung University, Hsinchu, 300, Taiwan, ROC;
Institute of Physics, National Chiao Tung University, Hsinchu, 300, Taiwan, ROC;
Department of Materials Science and Engineering. National Chiao Tung University, Hsinchu, 30049, Taiwan, ROC;
Bi_2Se_3; Thermoelectric properties; Nanostructure morphologies; Pulsed laser deposition (PLD); SiO2/Si(111) substrates;
机译:沉积后冷却气氛对脉冲激光沉积生长2%Al掺杂ZnO薄膜的热电性能的影响
机译:激光脉冲重复频率对脉冲激光沉积生长钴铁氧体薄膜形貌和磁性的影响
机译:脉冲激光沉积制备Bi_(0.9)Sr_(0.1)CuSeO外延膜的晶体取向,结晶度和热电性能
机译:取向C轴,在平面纹理硼化型薄膜沉积的脉冲激光沉积:结构,表面形态和物理性质
机译:脉冲激光沉积生长的绝缘体上纳米晶体金属膜的形貌演变。
机译:衬底温度和氧分压对脉冲激光沉积生长纳米晶铜氧化物薄膜性能的影响
机译:通过脉冲激光掠角沉积生长的snse薄膜的热电性能增强