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首页> 外文期刊>Applied Surface Science >Effect of sputtering parameters on optical and electrical properties of ITO films on PET substrates
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Effect of sputtering parameters on optical and electrical properties of ITO films on PET substrates

机译：溅射参数对PET基板上ITO膜的光学和电学性质的影响

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摘要

The optical and electrical properties of indium tin oxide (ITO) thin films deposited on flexible polyethylene terephthalate (PET) substrates using a DC magnetron sputtering technique are investigated as a function of the deposition time, the argon flow rate and the target-substrate distance. It is found that all of the ITO films contain a high fraction of amorphous phase. The volume fraction of crystallite precipitates in the amorphous host increases with an increasing deposition time or a reducing argon flow rate. The deposition time and argon flow rate have higher effects on the optical transparency of the ITO films than the target-substrate distance has. Increasing film thickness is not the only reason for the transmittance reduced. It is found that an increase of the extinction coefficient by increasing deposition time or an increase of the refractive index by decreasing argon flow rate also reduces the transmittance of thin film. For a constant deposition time, the resistivity of the ITO films reduces with a reducing argon flow rate or a reducing target-substrate distance. For a constant argon flow rate, a critical value of the deposition time exists at which both the resistivity and the effect of the target-substrate distance are minimized. Finally, it is concluded that the film resistivity has low sensitivity to the target-substrate distance if the best deposition conditions which mostly attain the lowest resistivity are matched.
机译：研究了使用直流磁控溅射技术沉积在柔性聚对苯二甲酸乙二醇酯（PET）衬底上的铟锡氧化物（ITO）薄膜的光学和电学性质，该薄膜与沉积时间，氩气流速和目标衬底距离之间的关系。已经发现所有的ITO膜都含有高比例的非晶相。非晶态主体中的微晶沉淀物的体积分数随沉积时间的增加或氩气流速的降低而增加。沉积时间和氩气流量对ITO薄膜的光学透明性的影响要大于目标衬底的距离。膜厚的增加不是透射率降低的唯一原因。已经发现，通过增加沉积时间来增加消光系数，或者通过降低氩气流量来增加折射率也降低了薄膜的透射率。对于恒定的沉积时间，ITO膜的电阻率会随着氩流速的降低或靶材与衬底之间距离的降低而降低。对于恒定的氩气流量，存在沉积时间的临界值，在该临界值处，电阻率和目标衬底距离的影响都最小化。最后，可以得出结论，如果匹配了大多数能够获得最低电阻率的最佳沉积条件，那么薄膜电阻率对目标衬底距离的敏感性就会降低。

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